Investigation of Perovskite Solar Cells Using Guanidinium Doped MAPbI3 Active Layer.

In this work, guanidinium (GA+) was doped into methylammonium lead triiodide (MAPbI3) perovskite film to fabricate perovskite solar cells (PSCs). To determine the optimal formulation of the resulting guanidinium-doped MAPbI3 ((GA)x(MA)1-xPbI3) for the perovskite active layer in PSCs, the perovskite films with various GA+ doping concentrations, annealing temperatures, and thicknesses were systematically modulated and studied. The experimental results demonstrated a 400-nm-thick (GA)x(MA)1-xPbI3 film, with 5% GA+ doping and annealed at 90 °C for 20 min, provided optimal surface morphology and crystallinity. The PSCs configured with the optimal (GA)x(MA)1-xPbI3 perovskite active layer exhibited an open-circuit voltage of 0.891 V, a short-circuit current density of 24.21 mA/cm2, a fill factor of 73.1%, and a power conversion efficiency of 15.78%, respectively. Furthermore, the stability of PSCs featuring this optimized (GA)x(MA)1-xPbI3 perovskite active layer was significantly enhanced.

Sensing Mechanism and Characterization of NO2 Gas Sensors Using Gold-Black NP-Decorated Ga2O3 Nanorod Sensing Membranes.

In this work, a vapor cooling condensation system was utilized to deposit various amounts of p-type gold-black nanoparticles (NPs) onto the surface of n-type gallium oxide (Ga2O3) nanorods forming p-n heterojunction-structured sensing membranes of nitrogen dioxide (NO2) gas sensors. The role and the sensing mechanism of the various gold-black NP-decorated Ga2O3 nanorods in NO2 gas sensors were investigated. The coverage and atomic percentage of the sensing membranes were observed using high-resolution transmission electron microscopy (HRTEM) measurements and energy-dispersive spectroscopy (EDS), respectively. For the NO2 gas sensor using the sensing membrane of 60 s-deposited gold-black NP-decorated Ga2O3 nanorods under a NO2 concentration of 10 ppm, the highest responsivity of 5221.1% was obtained. This result was attributed to the spillover effect and the formation of the p-n heterojunction, which increased more ionized-oxygen adsorption sites and promoted the reaction between NO2 gas and Ga2O3 nanorods. Furthermore, the NO2 gas sensor could detect the low NO2 concentration of 100 ppb and achieved a responsivity of 56.9%. The resulting NO2 gas sensor also exhibited excellent selectivity for detecting NO2 gas, with higher responsivity at a NO2 concentration of 10 ppm compared with that of the C2H5OH and NH3 concentrations of 100 ppm.

Investigation of the Performance of Perovskite Solar Cells with ZnO-Covered PC61BM Electron Transport Layer.

Due to its high carrier mobility and electron transmission, the phenyl-C61-butyric acid methyl ester (PC61BM) is usually used as an electron transport layer (ETL) in perovskite solar cell (PSC) configurations. However, PC61BM films suffer from poor coverage on perovskite active layers because of their low solubility and weak adhesive ability. In this work, to overcome the above-mentioned shortcomings, 30 nm thick PC61BM ETLs with different concentrations were modeled. Using a 30 nm thick PC61BM ETL with a concentration of 50 mg/mL, the obtained performance values of the PSCs were as follows: an open-circuit voltage (Voc) of 0.87 V, a short-circuit current density (Jsc) of 20.44 mA/cm2, a fill factor (FF) of 70.52%, and a power conversion efficiency (PCE) of 12.54%. However, undesired fine cracks present on the PC61BM surface degraded the performance of the resulting PSCs. To further improve performance, multiple different thicknesses of ZnO interface layers were deposited on the PC61BM ETLs to release the fine cracks using a thermal evaporator. In addition to the pavement of fine cracks, the ZnO interface layer could also function as a hole-blocking layer due to its larger highest occupied molecular orbital (HOMO) energy level. Consequently, the PCE was improved to 14.62% by inserting a 20 nm thick ZnO interface layer in the PSCs.

Investigation of High-Sensitivity NO2 Gas Sensors with Ga2O3 Nanorod Sensing Membrane Grown by Hydrothermal Synthesis Method.

In this work, Ga2O3 nanorods were converted from GaOOH nanorods grown using the hydrothermal synthesis method as the sensing membranes of NO2 gas sensors. Since a sensing membrane with a high surface-to-volume ratio is a very important issue for gas sensors, the thickness of the seed layer and the concentrations of the hydrothermal precursor gallium nitrate nonahydrate (Ga(NO3)3·9H2O) and hexamethylenetetramine (HMT) were optimized to achieve a high surface-to-volume ratio in the GaOOH nanorods. The results showed that the largest surface-to-volume ratio of the GaOOH nanorods could be obtained using the 50-nm-thick SnO2 seed layer and the Ga(NO3)3·9H2O/HMT concentration of 12 mM/10 mM. In addition, the GaOOH nanorods were converted to Ga2O3 nanorods by thermal annealing in a pure N2 ambient atmosphere for 2 h at various temperatures of 300 °C, 400 °C, and 500 °C, respectively. Compared with the Ga2O3 nanorod sensing membranes annealed at 300 °C and 500 °C, the NO2 gas sensors using the 400 °C-annealed Ga2O3 nanorod sensing membrane exhibited optimal responsivity of 1184.6%, a response time of 63.6 s, and a recovery time of 135.7 s at a NO2 concentration of 10 ppm. The low NO2 concentration of 100 ppb could be detected by the Ga2O3 nanorod-structured NO2 gas sensors and the achieved responsivity was 34.2%.

Lattice-Matched AlInN/GaN/AlGaN/GaN Heterostructured-Double-Channel Metal-Oxide-Semiconductor High-Electron Mobility Transistors with Multiple-Mesa-Fin-Channel Array.

Multiple-mesa-fin-channel array patterned by a laser interference photolithography system and gallium oxide (Ga2O3) gate oxide layer deposited by a vapor cooling condensation system were employed in double-channel Al0.83In0.17N/GaN/Al0.18Ga0.82N/GaN heterostructured-metal-oxide-semiconductors (MOSHEMTs). The double-channel was constructed by the polarized Al0.18Ga0.82N/GaN channel 1 and band discontinued lattice-matched Al0.83In0.17N/GaN channel 2. Because of the superior gate control capability, the generally induced double-hump transconductance characteristics of double-channel MOSHEMTs were not obtained in the devices. The superior gate control capability was contributed by the side-wall electrical field modulation in the fin-channel. Owing to the high-insulating Ga2O3 gate oxide layer and the high-quality interface between the Ga2O3 and GaN layers, low noise power density of 8.7 × 10-14 Hz-1 and low Hooge's coefficient of 6.25 × 10-6 of flicker noise were obtained. Furthermore, the devices had a unit gain cutoff frequency of 6.5 GHz and a maximal oscillation frequency of 12.6 GHz.

Performance Comparison of Lattice-Matched AlInN/GaN/AlGaN/GaN Double-Channel Metal-Oxide-Semiconductor High-Electron Mobility Transistors with Planar Channel and Multiple-Mesa-Fin-Channel Array.

In this work, Al0.83In0.17N/GaN/Al0.18Ga0.82N/GaN epitaxial layers used for the fabrication of double-channel metal-oxide-semiconductor high-electron mobility transistors (MOSHEMTs) were grown on silicon substrates using a metalorganic chemical vapor deposition system (MOCVD). A sheet electron density of 1.11 × 1013 cm-2 and an electron mobility of 1770 cm2/V-s were obtained. Using a vapor cooling condensation system to deposit high insulating 30-nm-thick Ga2O3 film as a gate oxide layer, double-hump transconductance behaviors with associated double-hump maximum extrinsic transconductances (gmmax) of 89.8 and 100.1 mS/mm were obtained in the double-channel planar MOSHEMTs. However, the double-channel devices with multiple-mesa-fin-channel array with a gmmax of 148.9 mS/mm exhibited single-hump transconductance behaviors owing to the better gate control capability. Moreover, the extrinsic unit gain cutoff frequency and maximum oscillation frequency of the devices with planar channel and multiple-mesa-fin-channel array were 5.7 GHz and 10.5 GHz, and 6.5 GHz and 12.6 GHz, respectively. Hooge's coefficients of 7.50 × 10-5 and 6.25 × 10-6 were obtained for the devices with planar channel and multiple-mesa-fin-channel array operating at a frequency of 10 Hz, drain-source voltage of 1 V, and gate-source voltage of 5 V, respectively.

Investigation of Ga2O3-Based Deep Ultraviolet Photodetectors Using Plasma-Enhanced Atomic Layer Deposition System.

In this work, Ga2O3 films were deposited on sapphire substrates using a plasma-enhanced atomic layer deposition system with trimethylgallium precursor and oxygen (O2) plasma. To improve the quality of Ga2O3 films, they were annealed in an O2 ambient furnace system for 15 min at 700, 800, and 900 °C, respectively. The performance improvement was verified from the measurement results of X-ray diffraction, X-ray photoelectron spectroscopy, and photoluminescence spectroscopy. The optical bandgap energy of the Ga2O3 films decreased with an increase of annealing temperatures. Metal-semiconductor-metal ultraviolet C photodetectors (MSM UVC-PDs) with various Ga2O3 active layers were fabricated and studied in this work. The cut-off wavelength of the MSM UVC-PDs with the Ga2O3 active layers annealed at 800 °C was 250 nm. Compared with the performance of the MSM UVC-PDs with the as-grown Ga2O3 active layers, the MSM UVC-PDs with the 800 °C-annealed Ga2O3 active layers under a bias voltage of 5 V exhibited better performances including photoresponsivity of 22.19 A/W, UV/visible rejection ratio of 5.98 × 104, and detectivity of 8.74 × 1012 cmHz1/2W-1.

Polymer hybrid white quantum dots light-emitting diodes with a nanostructured electron injection layer.

In this study, poly(N-vinylcarbazole) (PVK) polymer was blended with various dimensional CdSe/ZnS core-shell quantum dots to be used as a single emissive layer of white quantum dots light-emitting diodes (WQLEDs). Besides, the nanostructured ITO/ZnO nanorod array was used as electron transport/injection layer to shorten carrier transport distance, accelerate carrier transport velocity, and enhance carrier transport surface area. Consequently, luminance and luminous efficiency were increased by the resulting increase of the carrier injection current density and the hole-electron recombination opportunity. The CIE of (0.329, 0.331) was obtained for the WQLEDs by using the weight ratio of 1.5:1.3:2.2 of the red, green, and blue (RGB) quantum dots. Compared with the WQLEDs without the nanorod array, the WQLEDs with the 1.5-µm-periodic ITO/ZnO nanorod array obtained an increased luminance of 16333 cd/m2 (compared with 7191 cd/m2) and an increased luminous efficiency of 3.13 cd/A (compared with 2.30 cd/A).

Performance improvement of Y-doped VOx microbolometers with nanomesh antireflection layer.

In the study, the yttrium (Y)-doped vanadium oxide (VOx:Y) films used as the sensitive layers of microbolometers were deposited using a radio frequency magnetron co-sputtering system. The temperature coefficient of resistance (TCR) of the VOx:Y films was enhanced from -1.88%/°C to -2.85%/°C in comparison with that of the VOx films. To further improve the performance of microbolometers, the nanomesh antireflection layer was placed on the top surface of the microbolometers to reduce the infrared reflection. The responsivity, thermal time constant, thermal conductivity, absorptance, and detectivity of the VOx:Y microbolometers with nanomesh antireflection layer were 931.89 ± 48 kV/W, 4.48 ms, 6.19×10-8 W/K, 74.41% and 2.20×108 cmHz0.5W-1, respectively.

Three dimensional-stacked complementary thin-film transistors using n-type Al:ZnO and p-type NiO thin-film transistors.

The three dimensional inverters were fabricated using novel complementary structure of stacked bottom n-type aluminum-doped zinc oxide (Al:ZnO) thin-film transistor and top p-type nickel oxide (NiO) thin-film transistor. When the inverter operated at the direct voltage (VDD) of 10 V and the input voltage from 0 V to 10 V, the obtained high performances included the output swing of 9.9 V, the high noise margin of 2.7 V, and the low noise margin of 2.2 V. Furthermore, the high performances of unskenwed inverter were demonstrated by using the novel complementary structure of the stacked n-type Al:ZnO thin-film transistor and p-type nickel oxide (NiO) thin-film transistor.

Effect of Silver Dopants on the ZnO Thin Films Prepared by a Radio Frequency Magnetron Co-Sputtering System.

Ag-ZnO co-sputtered films at various atomic ratios of Ag (Ag/(Ag + Zn) at.%) were prepared by a radio frequency magnetron cosputtering system, using the co-sputtered targets of Ag and ZnO. The activation of the Ag acceptors (AgZn) and the formation of the Ag aggregations (Ag°) in the ZnO matrix were investigated from XRD, Raman scattering, and XPS measurements. The Ag-ZnO co-sputtered film behaving like a p-type conduction was achievable after annealing at 350 °C under air ambient for 1 h.

Nanomesh electrode on MgZnO-based metal-semiconductor-metal ultraviolet photodetectors.

In this work, the nano-scaled mesh electrodes are fabricated by obliquely depositing metals through the highly ordered polystyrene nanosphere mask. Furthermore, the intrinsic MgZnO film is deposited as the absorption layer for the metal-semiconductor-metal ultraviolet photodetectors (MSM-UV-PDs) using the vapor cooling condensation system. The 100-nm-linewidth nanomesh electrodes with metal occupying a roughly 10% of the device surface region consequently render PDs with a high transmittance in the ultraviolet (UV) wavelength range. The photoresponsivity of MgZnO-based MSM-UV-PDs evaluated at the wavelength of 330 nm with the operating bias voltage of 5 V is elevated from 0.135 to 0.248 A/W when the thin metal electrode is replaced by the nanomesh electrode, and the corresponding quantum efficiency is improved from 50.75 to 93.23%. Finally, adopting the nanomesh electrode also helps to enhance the UV-visible rejection ratio (R330nm/R450nm) and the detectivity from 1663 and 1.78 × 10(10) cmHz(0.5)W(-1) to 2480 and 2.43 × 10(10) cmHz(0.5)W(-1), respectively.

Origin of the Electroluminescence from Annealed-ZnO/GaN Heterojunction Light-Emitting Diodes.

This paper addressed the effect of post-annealed treatment on the electroluminescence (EL) of an n-ZnO/p-GaN heterojunction light-emitting diode (LED). The bluish light emitted from the 450 °C-annealed LED became reddish as the LED annealed at a temperature of 800 °C under vacuum atmosphere. The origins of the light emission for these LEDs annealed at various temperatures were studied using measurements of electrical property, photoluminescence, and Auger electron spectroscopy (AES) depth profiles. A blue-violet emission located at 430 nm was associated with intrinsic transitions between the bandgap of n-ZnO and p-GaN, the green-yellow emission at 550 nm mainly originating from the deep-level transitions of native defects in the n-ZnO and p-GaN surfaces, and the red emission at 610 nm emerging from the Ga-O interlayer due to interdiffusion at the n-ZnO/p-GaN interface. The above-mentioned emissions also supported the EL spectra of LEDs annealed at 700 °C under air, nitrogen, and oxygen atmospheres, respectively.

Electroluminescence emission of crystalline germanium nanoclusters deposited with laser assistance at low temperature.

With CO2 laser assistance, crystalline Ge nanocluster-embedded Ge films were deposited at low temperature using a conventional plasma-enhanced chemical vapor deposition system. Raman spectrum showed a wavenumber peak at 290 cm(-1) which corresponded to the crystalline Ge nanoclusters in the Ge film deposited with CO2 laser assistance. Crystalline Ge nanoclusters embedded in Ge matrices were observed from transmission electron microscopy (TEM) images and electron diffraction pattern. The electroluminescent devices constructed with multilayered Ge nanoclusters-embedded Ge films were fabricated. The experimental results demonstrated that the electroluminescence emission originated from the radiative recombination of the electron-hole pairs in the Ge nanoclusters.

Strong guided mode resonant local field enhanced visible harmonic generation in an azo-polymer resonant waveguide grating.

Guided mode resonance (GMR) enhanced second- and third-harmonic generation (SHG and THG) is demonstrated in an azo-polymer resonant waveguide grating (RWG), comprised of a poled azo-polymer layer on top of a textured SU8 substrate with a thin intervening layer of TiO2. Strong SHG and THG outputs are observed by matching either in-coming fundamental- or out-going harmonic-wavelength to the GMR wavelengths of the azo-polymer RWG. Without the azo-polymer coating, pure TiO2 RWGs, do not generate any detectable SHG using a fundamental beam peak intensity of 2 MW/cm(2). Without the textured TiO2 layer, a planar poled azo-polymer layer results in 3650 times less SHG than the full nonlinear RWG structure under identical excitation conditions. Rigorous coupled-wave analysis calculations confirm that this enhancement of the nonlinear conversion is due to strong local electric fields that are generated at the interfaces of the TiO2 and azo-polymer layers when the RWG is excited at resonant wavelengths associated with both SHG and THG conversion processes.

Guided-mode resonance enhanced excitation and extraction of two-photon photoluminescence in a resonant waveguide grating.

Guided-mode resonances enhanced excitation and extraction of two-photon photoluminescence (TPP) is demonstrated with a one-dimensional resonant waveguide grating (RWG) with a layer of fluorescent polymer (polyfluorene, PFO) on top. In this work, we design and fabricate a PFO RWG, in which two dispersive resonant modes in TE-polarization were measured. By aligning the red-shifting resonant mode with excitation wavelength in the infrared range, and the blue-shifting resonant mode with TPP spectrum in the visible range, the intensity of TPP can be enhanced up to 300-fold compared with that from a flat film with the same thickness coated on a glass slide. Such high enhancement results from firstly the strong evanescent local field in the waveguide layer due to the resonance between the incident light and the waveguide structure according to the results of rigorous coupled-wave analysis calculation, and secondly the enhanced extraction of the emission light which also resonates with the waveguide structure.

High performance mechanisms of near-infrared photodetectors with microcrystalline SiGe films deposited using laser-assisted plasma enhanced chemical vapor deposition system.

The SiH(4) and GeH(4) reactant gases used for depositing microcrystalline SiGe films could be simultaneously decomposed when acted cooperatively on the plasma and the assistant CO(2) laser in the laser-assisted plasma enhanced chemical vapor deposition system. The carrier mobility of the 80 W laser-assisted SiGe films was significantly increased to 66.8 cm(2)/V-s compared with 2.22 cm(2)/V-s of the non-laser-assisted SiGe films. The performances of the resulting p-Si/i-SiGe/n-Si near-infrared photodetectors were improved due to the high quality and high carrier mobility of the laser-assisted SiGe films. The maximum photoresponsivity and the maximum quantum efficiency of the photodetectors with 80 W laser-assisted SiGe films were respectively improved to 0.47 A/W and 68.5% in comparison with 0.31 A/W and 46.5% of the photodetectors with non-laser-assisted SiGe films.

Memory characteristics of metal-oxide-semiconductor structures based on Ge nanoclusters-embedded GeO(x) films grown at low temperature.

The memory devices constructed from the Ge-nanoclusters embedded GeO(x) layer deposited by the laser-assisted chemical vapor deposition (LACVD) system were fabricated. The Ge nanoclusters were observed by a high-resolution transmission electron microscopy. Using the capacitance versus voltage (C-V) and the conductance versus voltage (G-V) characteristics measured under various frequencies, the memory effect observed in the C-V curves was dominantly attributed to the charge storage in the Ge nanoclusters. Furthermore, the defects existed in the deposited film and the interface states were insignificant to the memory performances. Capacitance versus time (C-t) measurement was also executed to evaluate the charge retention characteristics. The charge storage and retention behaviors of the devices demonstrated that the Ge nanoclusters grown by the LACVD system at low temperature are promising for memory device applications.

Investigation of a photoelectrochemical passivated ZnO-based glucose biosensor.

A vapor cooling condensation system was used to deposit high quality intrinsic ZnO thin films and intrinsic ZnO nanorods as the sensing membrane of extended-gate field-effect-transistor (EGFET) glucose biosensors. The sensing sensitivity of the resulting glucose biosensors operated in the linear range was 13.4 µA mM(-1) cm(-2). To improve the sensing sensitivity of the ZnO-based glucose biosensors, the photoelectrochemical method was utilized to passivate the sidewall surfaces of the ZnO nanorods. The sensing sensitivity of the ZnO-based glucose biosensors with passivated ZnO nanorods was significantly improved to 20.33 µA mM(-1) cm(-2) under the same measurement conditions. The experimental results verified that the sensing sensitivity improvement was the result of the mitigation of the Fermi level pinning effect caused by the dangling bonds and the surface states induced on the sidewall surface of the ZnO nanorods.

Charge storage characteristics of silicon nanoclusters in silicon nitride matrix grown by laser assisted chemical vapor deposition method.

The capacitance-voltage (C-V) and charge retention characteristics of the metal-insulator-semiconductor (MIS) structure, in which the insulator layer was composed of silicon nanocluster-embedded silicon nitride, were studied. The memory effect of this MIS structure was dominantly attributed to the charge storage in the silicon nanoclusters. The relation between the flatband voltage shift and the amount of charges stored in the nanocluster-embedded insulator layer was discussed. The capacitance-time (C-t) relation of MIS structures, conventionally used to follow the discharge process, was further analyzed, indicating that care should be taken in the C-t measurement for obtaining correct discharging behavior. Then the charge retention characteristics of the fabricated MIS structures under various charging conditions were derived by the capacitance-time (C-t) measurement. The results showed that the devices, charged for a longer time or under a lower charging voltage, discharge slower. The observed charge retention behaviors can be reasonably attributed to the spatial distribution of silicon nanoclusters in the silicon nitride layer and the dispersion of the nanocluster sizes