RESUMEN
We observed tris-8-hydroxyquinoline aluminum (Alq3) thin films dependence on substrate heating temperatures by using a near-field microwave microprobe (NFMM) and by optical absorption at wavelengths between 200 and 900 nm. The changes of absorption intensity at different substrate heating temperatures are correlated to the changes in the sheet resistance of Alq3 thin films.
RESUMEN
Cadmium sulphide (CdS) thin films with different microstructures and morphologies were measured by using a near-field microwave microprobe (NFMM). The NFMM system was coupled to a dielectric resonator with a distance regulation system at an operating frequency f=4.1 GHz. The changes in dielectric permittivity of CdS thin films due to different annealing temperatures were investigated by measuring the reflection coefficient S(11). CdS thin films with different microstructures and morphology were characterized by X-ray diffraction, atomic force microscopy and NFMM.