High Precision Detection of Change in Intermediate Range Order of Amorphous Zirconia-Doped Tantala Thin Films Due to Annealing.

Understanding the local atomic order in amorphous thin film coatings and how it relates to macroscopic performance factors, such as mechanical loss, provides an important path towards enabling the accelerated discovery and development of improved coatings. High precision x-ray scattering measurements of thin films of amorphous zirconia-doped tantala (ZrO_{2}-Ta_{2}O_{5}) show systematic changes in intermediate range order (IRO) as a function of postdeposition heat treatment (annealing). Atomic modeling captures and explains these changes, and shows that the material has building blocks of metal-centered polyhedra and the effect of annealing is to alter the connections between the polyhedra. The observed changes in IRO are associated with a shift in the ratio of corner-sharing to edge-sharing polyhedra. These changes correlate with changes in mechanical loss upon annealing, and suggest that the mechanical loss can be reduced by developing a material with a designed ratio of corner-sharing to edge-sharing polyhedra.

Optical properties of oxygen vacancies in HfO2 thin films studied by absorption and luminescence spectroscopy.

Hafnium oxide thin films with varying oxygen content were investigated with the goal of finding the optical signature of oxygen vacancies in the film structure. It was found that a reduction of oxygen content in the film leads to changes in both, structural and optical characteristics. Optical absorption spectroscopy, using nanoKelvin calorimetry, revealed an enhanced absorption in the near-ultraviolet (near-UV) and visible wavelength ranges for films with reduced oxygen content, which was attributed to mid-gap electronic states of oxygen vacancies. Absorption in the near-infrared was found to originate from structural defects other than oxygen vacancy. Luminescence generated by continuous-wave 355-nm laser excitation in e-beam films showed significant changes in the spectral profile with oxygen reduction and new band formation linked to oxygen vacancies. The luminescence from oxygen-vacancy states was found to have microsecond-scale lifetimes when compared with nanosecond-scale lifetimes of luminescence attributed to other structural film defects. Laser-damage testing using ultraviolet nanosecond and infrared femtosecond pulses showed a reduction of the damage threshold with increasing number of oxygen vacancies in hafnium oxide films.

Analysis of surface deformation in thin-film coatings by carrier frequency interferometry.

We demonstrate a method based on carrier frequency interferometry (CFI) that measures surface deformation with high accuracy. The method is applied to assess the deformation of thin-film dielectrics deposited on thick substrates. CFI measured the wavefront radius of curvature R with an accuracy of 0.2% for an R smaller than 500 m and 2% for an R between 500 and 2000 m (flat reference substrate). We show the method has a significantly larger dynamic range and sensitivity than Twyman-Green and comparable sensitivity to white light interferometry.

Point defects in Sc2O3 thin films by ion beam sputtering.

We show that the concentration of oxygen interstitials trapped in Sc2O3 films by ion beam sputtering from metal targets can be controlled by modifying deposition conditions. We have identified point defects in the form of oxygen interstitials that are present in Sc2O3 films, in significantly high concentrations, i.e., ∼10(18) cm(-3). These results show a correlation between the increase of oxygen interstitials and the increase in stress and optical absorption in the films. Sc2O3 films with the lowest stress and optical absorption loss at 1 µm wavelength were obtained when using a low oxygen partial pressure and low beam voltage.

Defect-tolerant extreme ultraviolet nanoscale printing.

We present a defect-free lithography method for printing periodic features with nanoscale resolution using coherent extreme ultraviolet light. This technique is based on the self-imaging effect known as the Talbot effect, which is produced when coherent light is diffracted by a periodic mask. We present a numerical simulation and an experimental verification of the method with a compact extreme ultraviolet laser. Furthermore, we explore the extent of defect tolerance by testing masks with different defect layouts. The experimental results are in good agreement with theoretical calculations.

Sequential single-shot imaging of nanoscale dynamic interactions with a table-top soft x-ray laser.

We demonstrate the first real-space recording of nanoscale dynamic interactions using single-shot soft x-ray (SXR) full-field laser microscopy. A sequence of real-space flash images acquired with a table-top SXR laser was used to capture the motion of a rapidly oscillating magnetic nanoprobe. Changes of 30 nm in the oscillation amplitude were detected when the nanoprobe was made to interact with stray fields from a magnetic sample. The table-top visualization of nanoscale dynamics in real space can significantly contribute to the understanding of nanoscale processes and can accelerate the development of new nanodevices.

Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination.

We report the demonstration of a reflection microscope that operates at 13.2 nm wavelength with a spatial resolution of 55+/-3 nm. The microscope uses illumination from a tabletop extreme ultraviolet laser to acquire aerial images of photolithography masks with a 20 s exposure time. The modulation transfer function of the optical system was characterized.

Large area high efficiency broad bandwidth 800 nm dielectric gratings for high energy laser pulse compression.

We have demonstrated broad bandwidth large area (229 mm x 114 mm) multilayer dielectric diffraction gratings for the efficient compression of high energy 800 nm laser pulses at high average power. The gratings are etched in the top layers of an aperiodic (Nb0.5Ta0.5)2O5-SiO2 multilayer coating deposited by ion beam sputtering. The mean efficiency of the grating across the area is better than 97% at the center wavelength and remains above 96% at wavelengths between 820 nm and 780 nm. The gratings were used to compress 5.5 J pulses from a Ti:sapphire laser with an efficiency above 80 percent.

Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography.

Arrays of nanodots were directly patterned by interferometric lithography using a bright table-top 46.9 nm laser. Multiple exposures with a Lloyd's mirror interferometer allowed to print arrays of 60 nm FWHM features. This laser-based extreme ultraviolet interferometric technique makes possible to print different nanoscale patterns using a compact table-top set up.

Volume extreme ultraviolet nano-holographic imaging with numerical optical sectioning.

Three dimensional images were obtained using a single high numerical aperture hologram recorded in a high resolution photoresist with a table top lambda = 46.9 nm laser. Gabor holograms were numerically reconstructed over a range of image planes by sweeping the propagation distance in the numerical reconstruction algorithm, allowing numerical optical sectioning. A robust three dimension image of a test object was obtained with numerical optical sectioning, providing a longitudinal resolution of approximately 2 mum and a lateral resolution of 164 nm.

Nanometer-scale ablation with a table-top soft x-ray laser.

Ablation of holes with diameters as small as 82 nm and very clean walls was obtained in poly(methyl methacrylate) focusing pulses from a Ne-like Ar 46.9 nm compact capillary-discharge laser with a freestanding Fresnel zone plate diffracting into third order. These results demonstrate the feasibility of using focused soft x-ray laser beams for the direct nanoscale patterning of materials and the development of new nanoprobes.

High-brightness injection-seeded soft-x-ray-laser amplifier using a solid target.

We demonstrate the generation of an intense soft-x-ray-laser beam by saturated amplification of high harmonic seed pulses in a dense transient collisional soft-x-ray-laser plasma amplifier created by heating a titanium target. Amplification in the 32.6 nm line of Ne-like Ti generates laser pulses of subpicosecond duration that are measured to approach full spatial coherence. The peak spectral brightness is estimated to be approximately 2 x 10(26) photons/(s mm(2) mrad(2) 0.01% bandwidth). The scheme is scalable to produce extremely bright lasers at very short wavelengths with full temporal and spatial coherence.

Sub-38 nm resolution tabletop microscopy with 13 nm wavelength laser light.

We have acquired images with a spatial resolution better than 38 nm by using a tabletop microscope that combines 13 nm wavelength light from a high-brightness tabletop laser and Fresnel zone plate optics. These results open a gateway to the development of compact and widely available extreme-ultraviolet imaging tools capable of inspecting samples in a variety of environments with a 15-20 nm spatial resolution and a picosecond time resolution.

Sub 400 nm spatial resolution extreme ultraviolet holography with a table top laser.

We report sub-400 nm spatial resolution with Gabor holography obtained using a highly coherent table top 46.9 nm laser. The hologram was recorded in high resolution photoresist and subsequently digitized with an atomic force microscope. The final image was numerically reconstructed with a Fresnel propagator. Optimal reconstruction parameters and quantification of spatial resolution were obtained with a wavelet analysis and image correlation.

Nanoimaging with a compact extreme-ultraviolet laser.

Images with a spatial resolution of 120-150 nm were obtained with 46.9 nm light from a compact capillary-discharge laser by use of the combination of a Sc-Si multilayer-coated Schwarzschild condenser and a free-standing imaging zone plate. The results are relevant to the development of compact extreme-ultraviolet laser-based imaging tools for nanoscience and nanotechnology.

Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses.

The damage threshold and damage mechanism of extreme-ultraviolet Sc/Si multilayer mirror coatings are investigated with focused nanosecond pulses at 46.9-nm radiation from a compact capillary-discharge laser. Damage threshold fluences of approximately 0.08 J/cm2 are measured for coatings deposited on both borosilicate glass and Si substrates. The use of scanning and transmission electron microscopy and small-angle x-ray diffraction techniques reveals the thermal nature of the damage mechanism. The results are relevant to the use of newly developed high-flux extreme-ultraviolet sources in applications.

NO(2) photometer Based on Solid-State Light Sources.

A sensitive NO(2) analyzer, that uses a commercial LED emitting near 450 nm, has been developed. The prototype can measure NO(2) concentrations as low as 1 part in 10(9) as defined by the Environmental Protection Agency. The response time of the system is 1 min. In addition, a demonstration of the use of external-cavity frequency-doubled diode laser radiation to accomplish similar measurements is reported. However, because of low nonlinear optical conversion efficiencies, comparable detection limits were not possible. Nonetheless, frequency-doubled diode-laser wavelengths have the potential to reach farther into the UV than LED technology, allowing the detection and measurement of numerous other gaseous species of interest.