Scalable and robust beam shaping using apodized fish-bone grating couplers.

Efficient power coupling between on-chip guided and free-space optical modes requires precision spatial mode matching with apodized grating couplers. Yet, grating apodizations are often limited by the minimum feature size of the fabrication approach. This is especially challenging when small feature sizes are required to fabricate gratings at short wavelengths or to achieve weakly scattered light for large-area gratings. Here, we demonstrate a fish-bone grating coupler for precision beam shaping and the generation of millimeter-scale beams at 461 nm wavelength. Our design decouples the minimum feature size from the minimum achievable optical scattering strength, allowing smooth turn-on and continuous control of the emission. Our approach is compatible with commercial foundry photolithography and has reduced sensitivity to both the resolution and the variability of the fabrication approach compared to subwavelength meta-gratings, which often require electron beam lithography.

Integrating planar photonics for multi-beam generation and atomic clock packaging on chip.

The commercialization of atomic technologies requires replacing laboratory-scale laser setups with compact and manufacturable optical platforms. Complex arrangements of free-space beams can be generated on chip through a combination of integrated photonics and metasurface optics. In this work, we combine these two technologies using flip-chip bonding and demonstrate an integrated optical architecture for realizing a compact strontium atomic clock. Our planar design includes twelve beams in two co-aligned magneto-optical traps. These beams are directed above the chip to intersect at a central location with diameters as large as 1 cm. Our design also includes two co-propagating beams at lattice and clock wavelengths. These beams emit collinearly and vertically to probe the center of the magneto-optical trap, where they will have diameters of ≈100 µm. With these devices we demonstrate that our integrated photonic platform is scalable to an arbitrary number of beams, each with different wavelengths, geometries, and polarizations.

Impact of the precursor gas ratio on dispersion engineering of broadband silicon nitride microresonator frequency combs.

Microresonator frequency combs, or microcombs, have gained wide appeal for their rich nonlinear physics and wide range of applications. Stoichiometric silicon nitride films grown via low-pressure chemical vapor deposition (LPCVD), in particular, are widely used in chip-integrated Kerr microcombs. Critical to such devices is the ability to control the microresonator dispersion, which has contributions from both material refractive index dispersion and geometric confinement. Here, we show that modifications to the ratio of the gaseous precursors in LPCVD growth have a significant impact on material dispersion and hence the overall microresonator dispersion. In contrast to the many efforts focused on comparisons between Si-rich films and stoichiometric (Si3N4) films, here, we focus on films whose precursor gas ratios should nominally place them in the stoichiometric regime. We further show that microresonator geometric dispersion can be tuned to compensate for changes in the material dispersion.

Meta-grating outcouplers for optimized beam shaping in the visible.

Accurate coupling between optical modes at the interface between photonic chips and free space is required for the development of many on-chip devices. This control is critical in quantum technologies where large-diameter beams with designed mode profiles are required. Yet, these designs are often difficult to achieve at shorter wavelengths where fabrication limits the resolution of designed devices. In this work we demonstrate optimized outcoupling of free-space beams at 461 nm using a meta-grating approach that achieves a 16 dB improvement in the apodized outcoupling strength. We design and fabricate devices, demonstrating accurate reproduction of beams with widths greater than 100 µm.

The Nanolithography Toolbox.

This article introduces in archival form the Nanolithography Toolbox, a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST) developed the Nanolithography Toolbox to help users of the CNST NanoFab design devices with complex curves and aggressive critical dimensions. Using parameterized shapes as building blocks, the Nanolithography Toolbox allows users to rapidly design and layout nanoscale devices of arbitrary complexity through scripting and programming. The Toolbox offers many parameterized shapes, including structure libraries for micro- and nanoelectromechanical systems (MEMS and NEMS) and nanophotonic devices. Furthermore, the Toolbox allows users to precisely define the number of vertices for each shape or create vectorized shapes using Bezier curves. Parameterized control allows users to design smooth curves with complex shapes. The Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.