RESUMEN
This paper presents the traditional methods of GD depth analysis method and also its limitations, and the earlier studies of real-time depth measurement technology. A new method of real-time depth determination by laser technology for GD-OES depth analysis is proposed. The real-time depth measurement system is composed of laser displacement sensor and new designed Grimm-type GD source based on laser measurement method, and the system design and technical principles are described in detail. Sputtering depth measurement signal and element spectrum signal can be synchronously collected by this system. The displacement phenomenon of glow discharge source during real-time sputtering depth measurement process is analyzed. The real-time sputtering depth measurement curve of zinc alloy standard sample was tested by two laser displacement sensors measurement system. The actual value of sputtering depth was obtained by adding the depth measurement curve of sputtering surface and the reference plane curve, and the actual depth result is in line with Dektak8-type surface profilometer.
RESUMEN
The crater depth value of sample surface during sputtering is important analysis information for the depth profile analysis of glow discharge spectrometry. Real-time sputtered depth measurement with Laser triangulation measurement method for glow discharge compositional analysis, effectively solves the issues of incorrect depth value calculation and complicated procedures in traditional depth analysis method. This paper presents a new Grimm-type glow discharge source for real-time sputtering depth measurement by laser displacement sensor. This GD source also ensures fine sputtering effects and ideal resolution for multi-layer structure and interface. Optical fiber is used to transmit glow spectrum signal from GD-source to multi-channel photoelectric detection system. The design for the first time accomplishes the real-time signal collection and time-based synchronization analysis for both spectrum signal and sputtering depth signal. The real-time sputtering depth measurement curve of standard samples is obtained. The design and operating principle of this new-type GD-source is described in detail. Under the sputtering conditions of 30 mA, 900 V and 20 minutes, the sputtering rates of iron-based and copper-based sample sputtered by this GD source with good depth resolution are about 10 and 55 nm x s(-1). Surface topography picture of sputtering crater and microphotograph of metal samples are provided in the paper. Low-alloy steel standard sample is tested with this new GD source, the relative standard deviation (RSD) of C, Cu, Al, Ni, Mo, Mn and V elements are less than 1.7%, while for Cr and Si elements RSDs are less than 2.6%. The result data of the testing is provided in this paper.
RESUMEN
Along with the development of micro-electromechanical system technology, the reports on the optical splitting systems and the photoelectric detection systems of spectrometer based on micro-electromechanical system have become increasingly popular, whereas the reports on micro excitation source in the development of micro spectrometer are few. In other words, the development of micro excitation source is the most important part in the development of the micro spectrometer. A novel low-pressure microfabricated inductively coupled plasma source is introduced, which is an emission spectrum excitation source based on surface-micromaching technology. Its radio frequency power consumption is much lower than the general inductively coupled plasma source. The source can work at an argon gas pressure of 100 Pa, and thus consumes less argon. The principle of operation for a microfabricated inductively coupled plasma source is illustrated. The layout of the planar spiral-shaped coil, the matched capacitor and the resonant capacitor is given. The fabrication process and properties of the plasma source are described. Meanwhile a novel inductively coupled plasma based on the technology of printed circuit board is introduced. In the experiment, the planar spiral-shaped coil and interdigatial capacitor were used. When the pressure of argon was 100 Pa and the radio frequency power was 3. 5 W at 13. 56 MHz the novel inductively coupled plasma was ignited. The photo of the argon ignition is given. Finally the potential application of the micro inductively coupled plasma in spectrometers is presented.
