RESUMEN
Exsolution synthesizes self-assembled metal nanoparticle catalysts via phase precipitation. An overlooked aspect in this method thus far is how exsolution affects the host oxide surface chemistry and structure. Such information is critical as the oxide itself can also contribute to the overall catalytic activity. Combining X-ray and electron probes, we investigated the surface transformation of thin-film SrTi0.65Fe0.35O3 during Fe0 exsolution. We found that exsolution generates a highly Fe-deficient near-surface layer of about 2 nm thick. Moreover, the originally single-crystalline oxide near-surface region became partially polycrystalline after exsolution. Such drastic transformations at the surface of the oxide are important because the exsolution-induced nonstoichiometry and grain boundaries can alter the oxide ion transport and oxygen exchange kinetics and, hence, the catalytic activity toward water splitting or hydrogen oxidation reactions. These findings highlight the need to consider the exsolved oxide surface, in addition to the metal nanoparticles, in designing the exsolved nanocatalysts.
RESUMEN
The effects of ionizing radiation on materials often reduce to "bad news". Radiation damage usually leads to detrimental effects such as embrittlement, accelerated creep, phase instability, and radiation-altered corrosion. Here we report that proton irradiation decelerates intergranular corrosion of Ni-Cr alloys in molten fluoride salt at 650 °C. We demonstrate this by showing that the depth of intergranular voids resulting from Cr leaching into the salt is reduced by proton irradiation alone. Interstitial defects generated from irradiation enhance diffusion, more rapidly replenishing corrosion-injected vacancies with alloy constituents, thus playing the crucial role in decelerating corrosion. Our results show that irradiation can have a positive impact on materials performance, challenging our view that radiation damage usually results in negative effects.
RESUMEN
Future space telescopes, especially X-ray telescopes, will require thin mirrors to achieve high optical throughput. Thin mirrors are more difficult to fabricate than thick mirrors, but recent advances have made accurate fabrication of thin mirrors possible. However, mirrors must have a reflective coating, which typically has non-repeatable and non-uniform intrinsic stress that deforms a thin mirror. Reducing coating stress by controlling deposition parameters typically reduces reflectivity. Non-uniform integrated stress compensation (NISC) methods, in which spatially controlled stress is applied to the mirror substrate backside to balance the frontside coating stress, decouple the film stress from the reflectivity. Ion implantation is one NISC method, where high-energy ions are implanted into a glass or silicon substrate to generate stress near the substrate surface. In this paper, we demonstrate the use of ion implantation for stress compensation of 30 nm thick chromium films applied to the front of five silicon wafers. The reflective films have mean integrated stress between -8 and -35 N/m, which cause deformations between 400 and 1600 nm RMS. We demonstrate that these wafers can be restored to the pre-coating shape to within 60 nm RMS, in most cases within 1/20th of the coating deformation.
