Liquid crystal based active wavelength filter for phase-sensitive optical time domain reflectometry.

This study proposes a liquid-crystal-based active wavelength filter for phase-sensitive optical time domain reflectometry to mitigate the amplified spontaneous emission (ASE) noise and accurately match the passband with the light source. The validity of the proposed system was verified using comparative experiments with conventional passive optical filters. The experiment showed an increase in signal-to-noise ratio (SNR) of up to 2.21 dB compared with passive filters. Additionally, the proposed system can effectively eliminate ASE noise, resulting in an SNR of 12.99 dB.

Tracking Efficiency Improvement According to Incident Beam Size in QPD-Based PAT System for Common Path-Based Full-Duplex FSO Terminals.

Free space optical (FSO) communication can support various unmanned aerial vehicles' (UAVs) applications that require large capacity data transmission. In order to perform FSO communication between two terminals, it is essential to employ a pointing, acquisition, and tracking (PAT) system with an efficient and optimal performance. We report on the development of a common optical-path-based FSO communication system, tailored for applications in UAVs. The proposed system is equipped with a quadrant photodiode (QPD)-based PAT system without an additional beacon beam subsystem. The presented approach reduced the structural complexity and improved the tracking efficiency for the same size, weight, and power (SWaP). To achieve a robust FSO link in a dynamic UAV environment, the observability and controllability were obtained based on the linearized control according to the incident beam size on the QPD, which was verified by optical simulation and experiments. As a result, the QPD-based PAT system for implementing FSO links demonstrated an up to 4.25 times faster tracking performance. Moreover, the FSO link experimentally confirmed the 1.25 Gbps full-duplex error-free communication at a 50 m distance.

AuAg bimetallic nonalloyed nanoparticles on a periodically nanostructured GaAs substrate for enhancing light trapping.

We present a light trapping structure consisting of AuAg bimetallic nonalloyed nanoparticles (BNNPs) on cone-shaped GaAs subwavelength structures (SWSs), combining the advantages of plasmonic structures and SWSs for GaAs-based solar cell applications. To obtain efficient light trapping in solar cells, the optical properties' dependence on the size and composition of the Ag and Au metal nanoparticles was systematically investigated. Cone-shaped GaAs SWSs with AuAg BNNPs formed from an Au film of 12 nm and an Ag film of 10 nm exhibited the extremely low average reflectance (R(avg)) of 2.43% and the solar-weighted reflectance (SWR) of 2.38%, compared to that of a bare GaAs substrate (R(avg), 37.50%; SWR, 36.72%) in the wavelength range of 300 to 870 nm.

Broadband antireflective silicon nanostructures produced by spin-coated Ag nanoparticles.

We report the fabrication of broadband antireflective silicon (Si) nanostructures fabricated using spin-coated silver (Ag) nanoparticles as an etch mask followed by inductively coupled plasma (ICP) etching process. This fabrication technique is a simple, fast, cost-effective, and high-throughput method, making it highly suitable for mass production. Prior to the fabrication of Si nanostructures, theoretical investigations were carried out using a rigorous coupled-wave analysis method in order to determine the effects of variations in the geometrical features of Si nanostructures to obtain antireflection over a broad wavelength range. The Ag ink ratio and ICP etching conditions, which can affect the distribution, distance between the adjacent nanostructures, and height of the resulting Si nanostructures, were carefully adjusted to determine the optimal experimental conditions for obtaining desirable Si nanostructures for practical applications. The Si nanostructures fabricated using the optimal experimental conditions showed a very low average reflectance of 8.3%, which is much lower than that of bulk Si (36.8%), as well as a very low reflectance for a wide range of incident angles and different polarizations over a broad wavelength range of 300 to 1,100 nm. These results indicate that the fabrication technique is highly beneficial to produce antireflective structures for Si-based device applications requiring low light reflection.

Antireflective grassy surface on glass substrates with self-masked dry etching.

Although recently developed bio-inspired nanostructures exhibit superior optic performance, their practical applications are limited due to cost issues. We present highly transparent glasses with grassy surface fabricated with self-masked dry etch process. Simultaneously generated nanoclusters during reactive ion etch process with simple gas mixture (i.e., CF4/O2) enables lithography-free, one-step nanostructure fabrication. The resulting grassy surfaces, composed of tapered subwavelength structures, exhibit antireflective (AR) properties in 300 to 1,800-nm wavelength ranges as well as improved hydrophilicity for antifogging. Rigorous coupled-wave analysis calculation provides design guidelines for AR surface on glass substrates.

Enhanced power generation in concentrated photovoltaics using broadband antireflective coverglasses with moth eye structures.

We present the effect of broadband antireflective coverglasses (BARCs) with moth eye structures on the power generation capability of a sub-receiver module for concentrated photovoltaics. The period and height of the moth eye structures were designed by a rigorous coupled-wave analysis method in order to cover the full solar spectral ranges without transmission band shrinkage. The BARCs with moth eye structures were prepared by the dry etching of silver (Ag) nanomasks, and the fabricated moth eye structures on coverglass showed strongly enhanced transmittance compared to the bare glass with a flat surface, at wavelengths of 300 - 1800 nm. The BARCs were mounted on InGaP/GaAs/Ge triple-junction solar cells and the power conversion efficiency of this sub-receiver module reached 42.16% for 196 suns, which is a 7.41% boosted value compared to that of a module with bare coverglass, without any detrimental changes of the open circuit voltages (Voc) and fill factor (FF).

Antireflective disordered subwavelength structure on GaAs using spin-coated Ag ink mask.

We present a simple, cost-effective, large scale fabrication technique for antireflective disordered subwavelength structures (d-SWSs) on GaAs substrate by Ag etch masks formed using spin-coated Ag ink and subsequent inductively coupled plasma (ICP) etching process. The antireflection characteristics of GaAs d-SWSs rely on their geometric profiles, which were controlled by adjusting the distribution of Ag etch masks via changing the concentration of Ag atoms and the sintering temperature of Ag ink as well as the ICP etching conditions. The fabricated GaAs d-SWSs drastically reduced the reflection loss compared to that of bulk GaAs (>30%) in the wavelength range of 300-870 nm. The most desirable GaAs d-SWSs for practical solar cell applications exhibited a solar-weighted reflectance (SWR) of 2.12%, which is much lower than that of bulk GaAs (38.6%), and its incident angle-dependent SWR was also investigated.

Enhanced power generation in concentrated photovoltaics using broadband antireflective coverglasses with moth eye structures.

We present the effect of broadband antireflective coverglasses (BARCs) with moth eye structures on the power generation capability of a sub-receiver module for concentrated photovoltaics. The period and height of the moth eye structures were designed by a rigorous coupled-wave analysis method in order to cover the full solar spectral ranges without transmission band shrinkage. The BARCs with moth eye structures were prepared by the dry etching of silver (Ag) nanomasks, and the fabricated moth eye structures on coverglass showed strongly enhanced transmittance compared to the bare glass with a flat surface, at wavelengths of 300 - 1800 nm. The BARCs were mounted on InGaP/GaAs/Ge triple-junction solar cells and the power conversion efficiency of this sub-receiver module reached 42.16% for 196 suns, which is a 7.41% boosted value compared to that of a module with bare coverglass, without any detrimental changes of the open circuit voltages (V(oc)) and fill factor (FF).

Wafer-scale broadband antireflective silicon fabricated by metal-assisted chemical etching using spin-coating Ag ink.

We report broadband antireflective disordered subwavelength structures (d-SWSs), which were fabricated on 4-inch silicon wafers by spin-coating Ag ink and metal-assisted chemical etching. The antireflection properties of the d-SWSs depend on its dimensions and heights, which were changed by the sintering temperature of the spin-coated Ag ink and etching time. The fabricated d-SWSs drastically reduced surface reflection over a wide range of wavelengths and incident angles, providing good surface uniformity. The d-SWSs with the most appropriate geometry for practical solar cell applications exhibit only 1.23% solar-weighted reflectance in the wavelength range of 300-1100 nm and average reflectance <5% up to an incident angle of 55° in the wavelength range of 300-2500 nm. This simple and low-cost nanofabrication method for antireflection could be of great importance in optical device applications because it allows mass production without any lithography processes or sophisticated equipment.

Antireflective property of thin film a-Si solar cell structures with graded refractive index structure.

We report the antireflective property of thin film amorphous silicon (a-Si) solar cell structures based on graded refractive index structure together with theoretical analysis. Optimizations of the index profile are performed using the rigorous coupled-wave analysis method. The graded refractive index structure fabricated by oblique angle deposition suppresses optical reflection over a wide range of wavelength and incident angle, compared to the conventional structure. The average reflectance of thin film a-Si solar cell structure with the graded refractive index structure is suppressed by 54% at normal incidence due to the effective refractive index matching between ITO and a-Si, indicating a reasonable agreement with calculated results.

Antireflective properties of porous Si nanocolumnar structures with graded refractive index layers.

We report on the antireflective characteristics of porous silicon (Si) nanocolumnar structures consisting of graded refractive index layers and carry out a rigorous coupled-wave analysis simulation. The refractive index of Si is gradually modified by a tilted angle electron beam evaporation method. For the fabricated Si nanostructure with a Gaussian index profile of 100 nm, reflectivity (R) of less than 7.5% is obtained with an average value of approximately 2.9% at the wavelength region of 400-800 nm. The experimental results are reasonably consistent with the simulated results for the design of antireflective Si nanostructures.