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1.
ACS Nano ; 4(7): 3831-8, 2010 Jul 27.
Artigo em Inglês | MEDLINE | ID: mdl-20536187

RESUMO

Near-field scanning microwave microscopy is employed for quantitative imaging at 4 GHz of the local impedance for monolayer and few-layer graphene. The microwave response of graphene is found to be thickness dependent and determined by the local sheet resistance of the graphene flake. Calibration of the measurement system and knowledge of the probe geometry allows evaluation of the AC impedance for monolayer and few-layer graphene, which is found to be predominantly active. The use of localized evanescent electromagnetic field in our experiment provides a promising tool for investigations of plasma waves in graphene with wave numbers determined by the spatial spectrum of the near-field. By using near-field microwave microscopy one can perform simultaneous imaging of location, geometry, thickness, and distribution of electrical properties of graphene without a need for device fabrication.

2.
Rev Sci Instrum ; 79(11): 113708, 2008 Nov.
Artigo em Inglês | MEDLINE | ID: mdl-19045896

RESUMO

We have experimentally verified a recently proposed theoretical model for near-field microwave microscopy of multilayer media. The model addresses a near-field microwave probe as an electrically small antenna with a Gaussian-like current distribution that has a single characteristic length scale on the order of the probe size. Electrodynamic response of an antenna is calculated using Green functions in the form of integral transforms for electric and magnetic fields (both quasistatic and propagating), which are generated by a pointlike dipole. Experimental data were obtained at 4 GHz using a near-field scanning microwave microscope with aperture size of approximately 5 microm for a set of six SiO(2) films with thickness ranging from 0.1 to 1.5 microm. For each sample the probe resonant frequency was both measured and simulated as a function of the tip-sample distance, and good agreement between the theory and experimental data was observed. It was found that the model is capable of determining thin film dielectric constant with accuracy of approximately 5%-7%.

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