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Domain-dependent strain and stacking in two-dimensional van der Waals ferroelectrics.
Shi, Chuqiao; Mao, Nannan; Zhang, Kena; Zhang, Tianyi; Chiu, Ming-Hui; Ashen, Kenna; Wang, Bo; Tang, Xiuyu; Guo, Galio; Lei, Shiming; Chen, Longqing; Cao, Ye; Qian, Xiaofeng; Kong, Jing; Han, Yimo.
Affiliation
  • Shi C; Department of Materials Science and NanoEngineering, Rice University, Houston, TX, 77005, USA.
  • Mao N; Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA, USA.
  • Zhang K; Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.
  • Zhang T; Departments of Materials Science and Engineering, University of Texas at Arlington, Arlington, TX, USA.
  • Chiu MH; Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA, USA.
  • Ashen K; Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA, USA.
  • Wang B; Departments of Materials Science and Engineering, Texas A&M University, College Station, TX, USA.
  • Tang X; Materials Research Institute and Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA, USA.
  • Guo G; Departments of Materials Science and Engineering, Texas A&M University, College Station, TX, USA.
  • Lei S; Department of Materials Science and NanoEngineering, Rice University, Houston, TX, 77005, USA.
  • Chen L; Department of Physics, Rice University, Houston, TX, 77005, USA.
  • Cao Y; Materials Research Institute and Department of Materials Science and Engineering, The Pennsylvania State University, University Park, PA, USA.
  • Qian X; Departments of Materials Science and Engineering, University of Texas at Arlington, Arlington, TX, USA.
  • Kong J; Departments of Materials Science and Engineering, Texas A&M University, College Station, TX, USA.
  • Han Y; Department of Electrical and Computer Engineering, Texas A&M University, College Station, TX, USA.
Nat Commun ; 14(1): 7168, 2023 Nov 07.
Article in En | MEDLINE | ID: mdl-37935672
ABSTRACT
Van der Waals (vdW) ferroelectrics have attracted significant attention for their potential in next-generation nano-electronics. Two-dimensional (2D) group-IV monochalcogenides have emerged as a promising candidate due to their strong room temperature in-plane polarization down to a monolayer limit. However, their polarization is strongly coupled with the lattice strain and stacking orders, which impact their electronic properties. Here, we utilize four-dimensional scanning transmission electron microscopy (4D-STEM) to simultaneously probe the in-plane strain and out-of-plane stacking in vdW SnSe. Specifically, we observe large lattice strain up to 4% with a gradient across ~50 nm to compensate lattice mismatch at domain walls, mitigating defects initiation. Additionally, we discover the unusual ferroelectric-to-antiferroelectric domain walls stabilized by vdW force and may lead to anisotropic nonlinear optical responses. Our findings provide a comprehensive understanding of in-plane and out-of-plane structures affecting domain properties in vdW SnSe, laying the foundation for domain wall engineering in vdW ferroelectrics.

Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Nat Commun Journal subject: BIOLOGIA / CIENCIA Year: 2023 Document type: Article Affiliation country:

Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Nat Commun Journal subject: BIOLOGIA / CIENCIA Year: 2023 Document type: Article Affiliation country:
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