Modeling material saturation effects in microholographic recording.
Opt Express
; 15(4): 1732-7, 2007 Feb 19.
Article
in En
| MEDLINE
| ID: mdl-19532410
ABSTRACT
Microholographic data storage system model is presented that includes non-linear and non-local behavior of the storage material for accurate simulation of the system and optimization of the writing process. For the description of the photopolymer material a diffusion based nonlocal material model is used. The diffusion equation is solved numerically and the modulation of the dielectric constant is calculated. Diffraction efficiency of simulated microholograms and measurements were compared, and they show good agreement.
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Collection:
01-internacional
Database:
MEDLINE
Language:
En
Journal:
Opt Express
Journal subject:
OFTALMOLOGIA
Year:
2007
Document type:
Article