Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure.

Khorsand, A R; Sobierajski, R; Louis, E; Bruijn, S; van Hattum, E D; van de Kruijs, R W E; Jurek, M; Klinger, D; Pelka, J B; Juha, L; Burian, T; Chalupsky, J; Cihelka, J; Hajkova, V; Vysin, L; Jastrow, U; Stojanovic, N; Toleikis, S; Wabnitz, H; Tiedtke, K; Sokolowski-Tinten, K; Shymanovich, U; Krzywinski, J; Hau-Riege, S; London, R; Gleeson, A; Gullikson, E M; Bijkerk, F

Khorsand, A R; Sobierajski, R; Louis, E; Bruijn, S; van Hattum, E D; van de Kruijs, R W E; Jurek, M; Klinger, D; Pelka, J B; Juha, L; Burian, T; Chalupsky, J; Cihelka, J; Hajkova, V; Vysin, L; Jastrow, U; Stojanovic, N; Toleikis, S; Wabnitz, H; Tiedtke, K; Sokolowski-Tinten, K; Shymanovich, U; Krzywinski, J; Hau-Riege, S; London, R; Gleeson, A; Gullikson, E M; Bijkerk, F.

Affiliation

Khorsand AR; FOM-Institute for Plasma Physics Rijnhuizen, Edisonbaan 14, Nieuwegein, The Netherlands.

Opt Express ; 18(2): 700-12, 2010 Jan 18.

Article in En | MEDLINE | ID: mdl-20173890

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Full text: 1 Collection: 01-internacional Database: MEDLINE Main subject: Silicon / Optical Devices / Membranes, Artificial / Molybdenum Language: En Journal: Opt Express Journal subject: OFTALMOLOGIA Year: 2010 Document type: Article Affiliation country: Países Bajos

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