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Pixelated source and mask optimization for immersion lithography.
Ma, Xu; Han, Chunying; Li, Yanqiu; Dong, Lisong; Arce, Gonzalo R.
Affiliation
  • Ma X; Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China, School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, China.
J Opt Soc Am A Opt Image Sci Vis ; 30(1): 112-23, 2013 Jan 01.
Article in En | MEDLINE | ID: mdl-23456007
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: J Opt Soc Am A Opt Image Sci Vis Journal subject: OFTALMOLOGIA Year: 2013 Document type: Article Affiliation country: China Country of publication: Estados Unidos
Fulltext
Add to My VHL
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: J Opt Soc Am A Opt Image Sci Vis Journal subject: OFTALMOLOGIA Year: 2013 Document type: Article Affiliation country: China Country of publication: Estados Unidos