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Suppressing bias stress degradation in high performance solution processed organic transistors operating in air.
Iqbal, Hamna F; Ai, Qianxiang; Thorley, Karl J; Chen, Hu; McCulloch, Iain; Risko, Chad; Anthony, John E; Jurchescu, Oana D.
Affiliation
  • Iqbal HF; Department of Physics and Center for Functional Materials, Wake Forest University, Winston Salem, NC, USA.
  • Ai Q; Department of Chemistry and Center for Applied Energy Research (CAER), University of Kentucky, Lexington, KY, USA.
  • Thorley KJ; Department of Chemistry and Center for Applied Energy Research (CAER), University of Kentucky, Lexington, KY, USA.
  • Chen H; King Abdullah University of Science and Technology, KAUST Solar Center (KSC), Thuwal, Saudi Arabia.
  • McCulloch I; King Abdullah University of Science and Technology, KAUST Solar Center (KSC), Thuwal, Saudi Arabia.
  • Risko C; Department of Chemistry, Chemistry Research Laboratory, University of Oxford, Oxford, UK.
  • Anthony JE; Department of Chemistry and Center for Applied Energy Research (CAER), University of Kentucky, Lexington, KY, USA.
  • Jurchescu OD; Department of Chemistry and Center for Applied Energy Research (CAER), University of Kentucky, Lexington, KY, USA.
Nat Commun ; 12(1): 2352, 2021 04 21.
Article in En | MEDLINE | ID: mdl-33883553
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Nat Commun Journal subject: BIOLOGIA / CIENCIA Year: 2021 Document type: Article Affiliation country: Estados Unidos Country of publication: Reino Unido
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Nat Commun Journal subject: BIOLOGIA / CIENCIA Year: 2021 Document type: Article Affiliation country: Estados Unidos Country of publication: Reino Unido