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Chemical vapor deposition merges MoS2 grains into high-quality and centimeter-scale films on Si/SiO2.
Singh, Mukesh; Ghosh, Rapti; Chen, Yu-Siang; Yen, Zhi-Long; Hofmann, Mario; Chen, Yang-Fang; Hsieh, Ya-Ping.
Affiliation
  • Singh M; Department of Physics, National Taiwan University Taipei 106 Taiwan.
  • Ghosh R; Department of Physics, National Central University Chung Li 320 Taiwan.
  • Chen YS; Institute of Atomic and Molecular Sciences, Academia Sinica Taipei 115 Taiwan yphsieh@gate.sinica.edu.tw.
  • Yen ZL; Molecular Science and Technology, Taiwan International Graduate Program, Academia Sinica Taipei 115 Taiwan.
  • Hofmann M; Institute of Atomic and Molecular Sciences, Academia Sinica Taipei 115 Taiwan yphsieh@gate.sinica.edu.tw.
  • Chen YF; Department of Physics, National Taiwan University Taipei 106 Taiwan.
  • Hsieh YP; Department of Physics, National Taiwan University Taipei 106 Taiwan.
RSC Adv ; 12(10): 5990-5996, 2022 Feb 16.
Article in En | MEDLINE | ID: mdl-35424587
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: RSC Adv Year: 2022 Document type: Article Country of publication: Reino Unido
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: RSC Adv Year: 2022 Document type: Article Country of publication: Reino Unido