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Atomically Thin Amorphous Indium-Oxide Semiconductor Film Developed Using a Solution Process for High-Performance Oxide Transistors.
Park, Jun-Hyeong; Park, Won; Na, Jeong-Hyeon; Lee, Jinuk; Eun, Jun-Su; Feng, Junhao; Kim, Do-Kyung; Bae, Jin-Hyuk.
Affiliation
  • Park JH; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Park W; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Na JH; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Lee J; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Eun JS; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Feng J; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Kim DK; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Bae JH; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
Nanomaterials (Basel) ; 13(18)2023 Sep 16.
Article in En | MEDLINE | ID: mdl-37764597
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Nanomaterials (Basel) Year: 2023 Document type: Article Country of publication: Suiza
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Nanomaterials (Basel) Year: 2023 Document type: Article Country of publication: Suiza