Tabletop extreme ultraviolet reflectometer for quantitative nanoscale reflectometry, scatterometry, and imaging.
Rev Sci Instrum
; 94(12)2023 Dec 01.
Article
in En
| MEDLINE
| ID: mdl-38109468
ABSTRACT
Imaging using coherent extreme-ultraviolet (EUV) light provides exceptional capabilities for the characterization of the composition and geometry of nanostructures by probing with high spatial resolution and elemental specificity. We present a multi-modal tabletop EUV imaging reflectometer for high-fidelity metrology of nanostructures. The reflectometer is capable of measurements in three distinct modes intensity reflectometry, scatterometry, and imaging reflectometry, where each mode addresses different nanostructure characterization challenges. We demonstrate the system's unique ability to quantitatively and non-destructively measure the geometry and composition of nanostructures with tens of square microns field of view and sub-nanometer precision. Parameters such as surface and line edge roughness, density, nanostructure linewidth, and profile, as well as depth-resolved composition, can be quantitatively determined. The results highlight the applicability of EUV metrology to address a wide range of semiconductor and materials science challenges.
Full text:
1
Collection:
01-internacional
Database:
MEDLINE
Language:
En
Journal:
Rev Sci Instrum
/
Rev. sci. instrum
/
Review of scientific instruments
Year:
2023
Document type:
Article
Affiliation country:
Estados Unidos
Country of publication:
Estados Unidos