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Growth of ultrathin films of amorphous ruthenium-phosphorus alloys using a single source CVD precursor.
Shin, Jinhong; Waheed, Abdul; Agapiou, Kyriacos; Winkenwerder, Wyatt A; Kim, Hyun-Wu; Jones, Richard A; Hwang, Gyeong S; Ekerdt, John G.
Affiliation
  • Shin J; Texas Materials Institute, University of Texas at Austin, Austin, TX 78750, USA.
J Am Chem Soc ; 128(51): 16510-1, 2006 Dec 27.
Article in En | MEDLINE | ID: mdl-17177394
ABSTRACT
Thin films ( approximately 30 nm) of amorphous RuP alloys (P approximately 15-20%) can be grown by CVD from the single source precursor cis-H2Ru(PMe3)4 at 250-300 degrees C and 200 mTorr pressure on native SiO2.
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Collection: 01-internacional Database: MEDLINE Main subject: Organometallic Compounds / Phosphorus / Ruthenium / Membranes, Artificial Language: En Journal: J Am Chem Soc Year: 2006 Document type: Article Affiliation country: United States
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Collection: 01-internacional Database: MEDLINE Main subject: Organometallic Compounds / Phosphorus / Ruthenium / Membranes, Artificial Language: En Journal: J Am Chem Soc Year: 2006 Document type: Article Affiliation country: United States