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Sub-20 nm Si/Ge superlattice nanowires by metal-assisted etching.
Geyer, Nadine; Huang, Zhipeng; Fuhrmann, Bodo; Grimm, Silko; Reiche, Manfred; Nguyen-Duc, Trung-Kien; de Boor, Johannes; Leipner, Hartmut S; Werner, Peter; Gösele, Ulrich.
Affiliation
  • Geyer N; Max Planck Institute of Microstructure Physics, Weinberg 2, D-06120 Halle, Germany. ngeyer@mpi-halle.mpg.de
Nano Lett ; 9(9): 3106-10, 2009 Sep.
Article in En | MEDLINE | ID: mdl-19655719
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Full text: 1 Collection: 01-internacional Database: MEDLINE Main subject: Silicon / Nanowires / Germanium Language: En Journal: Nano Lett Year: 2009 Document type: Article Affiliation country: Germany Country of publication: United States
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Full text: 1 Collection: 01-internacional Database: MEDLINE Main subject: Silicon / Nanowires / Germanium Language: En Journal: Nano Lett Year: 2009 Document type: Article Affiliation country: Germany Country of publication: United States