Cyclic block copolymers for controlling feature sizes in block copolymer lithography. | ACS Nano;6(12): 10845-54, 2012 Dec 21. | MEDLINE

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Cyclic block copolymers for controlling feature sizes in block copolymer lithography.

Poelma, Justin E; Ono, Kosuke; Miyajima, Daigo; Aida, Takuzo; Satoh, Kotaro; Hawker, Craig J.

Affiliation

Poelma JE; Materials Research Laboratory, University of California, Santa Barbara, California 93106, USA.

ACS Nano ; 6(12): 10845-54, 2012 Dec 21.

Article in En | MEDLINE | ID: mdl-23194415

Subject(s)

Polyethylene Glycols/chemistry; Polystyrenes/chemistry; Printing/methods; Cyclization; Oxidation-Reduction; Polyethylene Glycols/chemical synthesis; Polystyrenes/chemical synthesis; Temperature

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Full text: 1 Collection: 01-internacional Database: MEDLINE Main subject: Polyethylene Glycols / Polystyrenes / Printing Language: En Journal: ACS Nano Year: 2012 Document type: Article Affiliation country: United States

Search on Google

Full text: 1 Collection: 01-internacional Database: MEDLINE Main subject: Polyethylene Glycols / Polystyrenes / Printing Language: En Journal: ACS Nano Year: 2012 Document type: Article Affiliation country: United States