Chemical etching behaviors of semipolar (11Ì22) and nonpolar (11Ì20) gallium nitride films.

Jung, Younghun; Baik, Kwang Hyeon; Mastro, Michael A; Hite, Jennifer K; Eddy, Charles R; Kim, Jihyun

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Chemical etching behaviors of semipolar (11Ì22) and nonpolar (11Ì20) gallium nitride films.

Jung, Younghun; Baik, Kwang Hyeon; Mastro, Michael A; Hite, Jennifer K; Eddy, Charles R; Kim, Jihyun.

Affiliation

Jung Y; Department of Chemical and Biological Engineering, Korea University, Seoul 136-713, Korea. hyunhyun7@korea.ac.kr.

Phys Chem Chem Phys ; 16(30): 15780-3, 2014 Aug 14.

Article in En | MEDLINE | ID: mdl-24971494

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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Phys Chem Chem Phys Journal subject: BIOFISICA / QUIMICA Year: 2014 Document type: Article