Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111).
ACS Appl Mater Interfaces
; 7(30): 16428-39, 2015 Aug 05.
Article
in En
| MEDLINE
| ID: mdl-26158796
Full text:
1
Collection:
01-internacional
Database:
MEDLINE
Language:
En
Journal:
ACS Appl Mater Interfaces
Journal subject:
BIOTECNOLOGIA
/
ENGENHARIA BIOMEDICA
Year:
2015
Document type:
Article
Affiliation country:
United States