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Chemical vapor deposition of monolayer-thin WS2 crystals from the WF6 and H2S precursors at low deposition temperature.
Groven, B; Claes, D; Nalin Mehta, A; Bender, H; Vandervorst, W; Heyns, M; Caymax, M; Radu, I; Delabie, A.
Affiliation
  • Groven B; Department of Chemistry, KU Leuven (University of Leuven), Leuven 3001, Belgium.
  • Claes D; Department of Chemistry, KU Leuven (University of Leuven), Leuven 3001, Belgium.
  • Nalin Mehta A; imec, Kapeldreef 75, 3001 Leuven, Belgium.
  • Bender H; imec, Kapeldreef 75, 3001 Leuven, Belgium.
  • Vandervorst W; imec, Kapeldreef 75, 3001 Leuven, Belgium.
  • Heyns M; imec, Kapeldreef 75, 3001 Leuven, Belgium.
  • Caymax M; imec, Kapeldreef 75, 3001 Leuven, Belgium.
  • Radu I; imec, Kapeldreef 75, 3001 Leuven, Belgium.
  • Delabie A; Department of Chemistry, KU Leuven (University of Leuven), Leuven 3001, Belgium.
J Chem Phys ; 150(10): 104703, 2019 Mar 14.
Article in En | MEDLINE | ID: mdl-30876349
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: J Chem Phys Year: 2019 Document type: Article Affiliation country: Belgium Country of publication: United States
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: J Chem Phys Year: 2019 Document type: Article Affiliation country: Belgium Country of publication: United States