The interplay between drift and electrical measurement in conduction atomic force microscopy. | Rev Sci Instrum;90(7): 073701, 2019 Jul. | MEDLINE

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The interplay between drift and electrical measurement in conduction atomic force microscopy.

Ranjan, A; Pey, K L; O'Shea, S J.

Affiliation

Ranjan A; Engineering Product Development, Singapore University of Technology and Design, 8 Somapah Road, Singapore 487372.
Pey KL; Engineering Product Development, Singapore University of Technology and Design, 8 Somapah Road, Singapore 487372.
O'Shea SJ; Institute of Materials Research and Engineering, Agency for Science Technology and Research, 2 Fusionopolis Way, Singapore 138634.

Rev Sci Instrum ; 90(7): 073701, 2019 Jul.

Article in En | MEDLINE | ID: mdl-31370442

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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Rev Sci Instrum Year: 2019 Document type: Article Country of publication: United States

Search on Google

Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Rev Sci Instrum Year: 2019 Document type: Article Country of publication: United States