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Site-Selective Atomic Layer Precision Thinning of MoS2 via Laser-Assisted Anisotropic Chemical Etching.
Rho, Yoonsoo; Pei, Jiayun; Wang, Letian; Su, Zhengliang; Eliceiri, Matthew; Grigoropoulos, Costas P.
Affiliation
  • Rho Y; Laser Thermal Lab, Department of Mechanical Engineering , University of California , Berkeley , California 94720 , United States.
  • Pei J; Department of Mechanical Engineering , Tsinghua University , Beijing 100084 , People's Republic of China.
  • Wang L; Laser Thermal Lab, Department of Mechanical Engineering , University of California , Berkeley , California 94720 , United States.
  • Su Z; Laser Thermal Lab, Department of Mechanical Engineering , University of California , Berkeley , California 94720 , United States.
  • Eliceiri M; Laser Thermal Lab, Department of Mechanical Engineering , University of California , Berkeley , California 94720 , United States.
  • Grigoropoulos CP; Laser Thermal Lab, Department of Mechanical Engineering , University of California , Berkeley , California 94720 , United States.
ACS Appl Mater Interfaces ; 11(42): 39385-39393, 2019 Oct 23.
Article in En | MEDLINE | ID: mdl-31553575

Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: ACS Appl Mater Interfaces Journal subject: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Year: 2019 Document type: Article Affiliation country: United States Country of publication: United States

Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: ACS Appl Mater Interfaces Journal subject: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Year: 2019 Document type: Article Affiliation country: United States Country of publication: United States