Unveiling the Origin of Robust Ferroelectricity in Sub-2 nm Hafnium Zirconium Oxide Films.
ACS Appl Mater Interfaces
; 13(30): 36499-36506, 2021 Aug 04.
Article
in En
| MEDLINE
| ID: mdl-34310129
Full text:
1
Collection:
01-internacional
Database:
MEDLINE
Language:
En
Journal:
ACS Appl Mater Interfaces
Journal subject:
BIOTECNOLOGIA
/
ENGENHARIA BIOMEDICA
Year:
2021
Document type:
Article