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Ion beam composition in ion source based on magnetron sputtering discharge at extremely low working pressure.
Vizir, A V; Bugaev, A S; Frolova, V P; Gushenets, V I; Nikolaev, A G; Oks, E M; Yushkov, G Yu.
Affiliation
  • Vizir AV; Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, 2/3 Akademichesky Ave., Tomsk 634055, Russia.
  • Bugaev AS; Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, 2/3 Akademichesky Ave., Tomsk 634055, Russia.
  • Frolova VP; Tomsk State University of Control Systems and Radioelectronics, 40 Lenin Ave., Tomsk 634050, Russia.
  • Gushenets VI; Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, 2/3 Akademichesky Ave., Tomsk 634055, Russia.
  • Nikolaev AG; Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, 2/3 Akademichesky Ave., Tomsk 634055, Russia.
  • Oks EM; Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, 2/3 Akademichesky Ave., Tomsk 634055, Russia.
  • Yushkov GY; Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, 2/3 Akademichesky Ave., Tomsk 634055, Russia.
Rev Sci Instrum ; 93(4): 043304, 2022 Apr 01.
Article in En | MEDLINE | ID: mdl-35489919
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Rev Sci Instrum Year: 2022 Document type: Article Affiliation country: RUSSIA Country of publication: United States
Fulltext
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Rev Sci Instrum Year: 2022 Document type: Article Affiliation country: RUSSIA Country of publication: United States