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Mesoscopic-scale grain formation in HfO2-based ferroelectric thin films and its impact on electrical characteristics.
Kobayashi, Masaharu; Wu, Jixuan; Sawabe, Yoshiki; Takuya, Saraya; Hiramoto, Toshiro.
Affiliation
  • Kobayashi M; d.lab, School of Engineering, The University of Tokyo, 4-6-1 Komaba Meguro-Ku, Tokyo, 153-8505, Japan. masa-kobayashi@nano.iis.u-tokyo.ac.jp.
  • Wu J; Institute of Industrial Science, The University of Tokyo, 4-6-1, Komaba Meguro-Ku, Tokyo, 153-8505, Japan.
  • Sawabe Y; Institute of Industrial Science, The University of Tokyo, 4-6-1, Komaba Meguro-Ku, Tokyo, 153-8505, Japan.
  • Takuya S; Institute of Industrial Science, The University of Tokyo, 4-6-1, Komaba Meguro-Ku, Tokyo, 153-8505, Japan.
  • Hiramoto T; Institute of Industrial Science, The University of Tokyo, 4-6-1, Komaba Meguro-Ku, Tokyo, 153-8505, Japan.
Nano Converg ; 9(1): 50, 2022 Nov 12.
Article in En | MEDLINE | ID: mdl-36370230
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Full text: 1 Collection: 01-internacional Database: MEDLINE Type of study: Prognostic_studies Language: En Journal: Nano Converg Year: 2022 Document type: Article Affiliation country: Japan
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Full text: 1 Collection: 01-internacional Database: MEDLINE Type of study: Prognostic_studies Language: En Journal: Nano Converg Year: 2022 Document type: Article Affiliation country: Japan