Wet-Oxidation-Assisted Chemical Mechanical Polishing and High-Temperature Thermal Annealing for Low-Loss 4H-SiC Integrated Photonic Devices.
Materials (Basel)
; 16(6)2023 Mar 14.
Article
in En
| MEDLINE
| ID: mdl-36984202
Full text:
1
Collection:
01-internacional
Database:
MEDLINE
Language:
En
Journal:
Materials (Basel)
Year:
2023
Document type:
Article
Affiliation country:
Denmark
Country of publication:
Switzerland