The Deposition and Properties of Titanium Films Prepared by High Power Pulsed Magnetron Sputtering. | Materials (Basel);16(23)2023 Nov 23. | MEDLINE

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The Deposition and Properties of Titanium Films Prepared by High Power Pulsed Magnetron Sputtering.

Jiang, Quanxin; Ma, Donglin; Li, Yantao; Chen, Changzi.

Affiliation

Jiang Q; Jingchu University of Technology, Jingmen 448000, China.
Ma D; Chengdu Normal University, Chengdu 611130, China.
Li Y; Mianyang Normal University, Mianyang 621000, China.
Chen C; Jingchu University of Technology, Jingmen 448000, China.

Materials (Basel) ; 16(23)2023 Nov 23.

Article in En | MEDLINE | ID: mdl-38068038

Key words

Ti film; corrosion resistance; friction and wear resistance; high-power pulsed magnetron sputtering technology (HPPMS/HiPIMS); stress

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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Materials (Basel) Year: 2023 Document type: Article Affiliation country: China Country of publication: Switzerland

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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Materials (Basel) Year: 2023 Document type: Article Affiliation country: China Country of publication: Switzerland