Oxygen vacancy-rich ß-Bi2O3/Bi2O2SiO3 Z-Scheme heterojunction: A strategy to enhance visible light-driven photocatalytic removal of ARB and ARGs.

ABSTRACT

Oxygen vacancy-rich ß-Bi2O3/Bi2O2SiO3 (BO/BOS) Z-Scheme heterojunction was prepared by hydrothermal method-assisted calcination. Under visible light, ß-Bi2O3/Bi2O2SiO3 photocatalyst demonstrated superior photocatalytic efficacy in degrading antibiotics and antibiotic-resistant Escherichia coli (AR E. coli) compared to individual ß-Bi2O3 and Bi2O2SiO3. The experimental results showed that BO/BOS-450 sample possessed the best photocatalytic activity against tetracycline (2 h, 80.8%), amoxicillin (4 h, 57.9%) and AR E. coli (3 h, 107.43 CFU·mL-1). BO/BOS-450 sample showed 91.8% electrostatic capture of AR E. coli in the bacterial capture experiment. In the antibiotic-resistant genes (ARGs) degradation experiment, BO/BOS-450 sample was able to bring the log10 (Ct/C0) value of tetA to -3.49 after 2 h. Oxygen vacancies (OVs) were verified through HR-TEM, XPS and EPR analyses. ESR experiments aligned with the quenching experiment results, confirming that the crucial active species were ‧O2- and h+ during photocatalytic sterilization. A small-scale sewage treatment equipment was designed for the effective removal of ARB from real water samples.