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Coulomb energy determination of a single Si dangling bond.
Nguyen, T H; Mahieu, G; Berthe, M; Grandidier, B; Delerue, C; Stiévenard, D; Ebert, Ph.
Afiliación
  • Nguyen TH; Institut d'Electronique, de Microélectronique et de Nanotechnologie, IEMN (CNRS, UMR 8520), Département ISEN, 41 bd Vauban, 59046 Lille Cedex, France.
Phys Rev Lett ; 105(22): 226404, 2010 Nov 26.
Article en En | MEDLINE | ID: mdl-21231404
Determination of the Coulomb energy of single point defects is essential because changing their charge state critically affects the properties of materials. Based on a novel approach that allows us to simultaneously identify a point defect and to monitor the occupation probability of its electronic state, we unambiguously measure the charging energy of a single Si dangling bond with tunneling spectroscopy. Comparing the experimental result with tight-binding calculations highlights the importance of the particular surrounding of the localized state on the effective charging energy.
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Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Phys Rev Lett Año: 2010 Tipo del documento: Article País de afiliación: Francia Pais de publicación: Estados Unidos
Buscar en Google
Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Phys Rev Lett Año: 2010 Tipo del documento: Article País de afiliación: Francia Pais de publicación: Estados Unidos