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Pressure and scattering regime influence on the EDS profile resolution at a composite interface in environmental SEM.
Arnoult, Claire; Di Martino, Jean; Khouchaf, Lahcen; Toniazzo, Valérie; Ruch, David.
Afiliación
  • Arnoult C; Department of Advanced Materials and Structures, Centre de Recherche Public Henri Tudor, L-4002 Esch-sur-Alzette, Luxembourg. claire.arnoult@tudor.lu
Micron ; 42(8): 877-83, 2011 Dec.
Article en En | MEDLINE | ID: mdl-21723736
Gas impact on the EDS profile resolution at the interface of composite interface resin/Al was investigated with two gaseous environments: helium and water vapor. Two main components of the global profile at the interface were investigated: the contrast of the profile and the spatial resolution. A complementary approach was developed by comparing gas nature impact versus the pressure and versus the scattering regime. The results show that the unscattered electron beam mainly governs EDS profile spatial resolution as long as the scattering regime is single or oligo scattering. Then for plural scattering, spatial resolution is dramatically degraded. In addition, the contrast is degraded since a gas is introduced, whatever the gas, the pressure and so the scattering regime. This approach would enable to better understand the respective contributions of the unscattered beam and the skirt and the influence of the gases nature on them.

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Micron Asunto de la revista: DIAGNOSTICO POR IMAGEM Año: 2011 Tipo del documento: Article País de afiliación: Luxemburgo Pais de publicación: Reino Unido

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Micron Asunto de la revista: DIAGNOSTICO POR IMAGEM Año: 2011 Tipo del documento: Article País de afiliación: Luxemburgo Pais de publicación: Reino Unido