A simple and scalable route to wafer-size patterned graphene.
J Mater Chem
; 20(24): 5041-5046, 2010 Jun 28.
Article
en En
| MEDLINE
| ID: mdl-24155570
ABSTRACT
Producing large-scale graphene films with controllable patterns is an essential component of graphene-based nanodevice fabrication. Current methods of graphene pattern preparation involve either high cost, low throughput patterning processes or sophisticated instruments, hindering their large-scale fabrication and practical applications. We report a simple, effective, and reproducible approach for patterning graphene films with controllable feature sizes and shapes. The patterns were generated using a versatile photocoupling chemistry. Features from micrometres to centimetres were fabricated using a conventional photolithography process. This method is simple, general, and applicable to a wide range of substrates including silicon wafers, glass slides, and metal films.
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1
Colección:
01-internacional
Base de datos:
MEDLINE
Idioma:
En
Revista:
J Mater Chem
Año:
2010
Tipo del documento:
Article
País de afiliación:
Estados Unidos