Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography.

Tarrio, Charles; Grantham, Steven; Squires, Matthew B; Vest, Robert E; Lucatorto, Thomas B

Tarrio, Charles; Grantham, Steven; Squires, Matthew B; Vest, Robert E; Lucatorto, Thomas B.

Afiliación

Tarrio C; National Institute of Standards and Technology, Gaithersburg, MD, 20899-8410 USA.
Grantham S; National Institute of Standards and Technology, Gaithersburg, MD, 20899-8410 USA.
Squires MB; National Institute of Standards and Technology, Gaithersburg, MD, 20899-8410 USA.
Vest RE; National Institute of Standards and Technology, Gaithersburg, MD, 20899-8410 USA.
Lucatorto TB; National Institute of Standards and Technology, Gaithersburg, MD, 20899-8410 USA.

J Res Natl Inst Stand Technol ; 108(4): 267-73, 2003.

Article en En | MEDLINE | ID: mdl-27413610

Palabras clave

extreme ultraviolet; lithography; metrology; reflectometry; synchrotron radiation

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: J Res Natl Inst Stand Technol Año: 2003 Tipo del documento: Article