Edge Delamination of Monolayer Transition Metal Dichalcogenides.

Ly, Thuc Hue; Yun, Seok Joon; Thi, Quoc Huy; Zhao, Jiong

Ly, Thuc Hue; Yun, Seok Joon; Thi, Quoc Huy; Zhao, Jiong.

Afiliación

Ly TH; Department of Applied Physics, The Hong Kong Polytechnic University , Hong Kong SAR, People's Republic of China.
Yun SJ; Department of Chemistry and Center of Super-Diamond & Advanced Films (COSDAF), City University of Hong Kong , Hong Kong SAR, People's Republic of China.
Thi QH; IBS Center for Integrated Nanostructure Physics, Institute for Basic Science, Sungkyunkwan University , Suwon 440-746, Korea.
Zhao J; IBS Center for Integrated Nanostructure Physics, Institute for Basic Science, Sungkyunkwan University , Suwon 440-746, Korea.

ACS Nano ; 11(7): 7534-7541, 2017 07 25.

Article en En | MEDLINE | ID: mdl-28696662

Palabras clave

AFM; PL; TEM; edge delaminate; molybdenum disulfide; tungsten disulfide

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: ACS Nano Año: 2017 Tipo del documento: Article Pais de publicación: Estados Unidos

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