EUV polarimetry for thin film and surface characterization and EUV phase retarder reflector development.
Rev Sci Instrum
; 89(1): 015108, 2018 Jan.
Article
en En
| MEDLINE
| ID: mdl-29390727
ABSTRACT
The knowledge and the manipulation of light polarization state in the vacuum ultraviolet and extreme ultraviolet (EUV) spectral regions play a crucial role from materials science analysis to optical component improvements. In this paper, we present an EUV spectroscopic ellipsometer facility for polarimetry in the 90-160 nm spectral range. A single layer aluminum mirror to be used as a quarter wave retarder has been fully characterized by deriving the optical and structural properties from the amplitude component and phase difference δ measurements. The system can be suitable to investigate the properties of thin films and optical coatings and optics in the EUV region.
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1
Colección:
01-internacional
Base de datos:
MEDLINE
Idioma:
En
Revista:
Rev Sci Instrum
Año:
2018
Tipo del documento:
Article
País de afiliación:
Italia