Josephson Effect and Charge Distribution in Thin Bi<sub>2</sub> Te<sub>3</sub> Topological Insulators.

Stehno, Martin P; Ngabonziza, Prosper; Myoren, Hiroaki; Brinkman, Alexander

Josephson Effect and Charge Distribution in Thin Bi₂ Te₃ Topological Insulators.

Stehno, Martin P; Ngabonziza, Prosper; Myoren, Hiroaki; Brinkman, Alexander.

Afiliación

Stehno MP; Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, 7500 AE, Enschede, The Netherlands.
Ngabonziza P; Physikalisches Institut EP3, University of Würzburg, Am Hubland, 97070, Würzburg, Germany.
Myoren H; Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, 7500 AE, Enschede, The Netherlands.
Brinkman A; Max Planck Institute for Solid State Research, 70569, Stuttgart, Germany.

Adv Mater ; 32(14): e1908351, 2020 Apr.

Article en En | MEDLINE | ID: mdl-32091158

Palabras clave

Josephson junctions; bismuth telluride; diffusive transport; superconductivity; topological insulators

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Adv Mater Asunto de la revista: BIOFISICA / QUIMICA Año: 2020 Tipo del documento: Article País de afiliación: Países Bajos Pais de publicación: Alemania

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