Atomic layer deposition of tungsten sulfide using a new metal-organic precursor and H<sub>2</sub>S: thin film catalyst for water splitting.

Kim, Deok-Hyun; Ramesh, Rahul; Nandi, Dip K; Bae, Jong-Seong; Kim, Soo-Hyun

Atomic layer deposition of tungsten sulfide using a new metal-organic precursor and H₂S: thin film catalyst for water splitting.

Kim, Deok-Hyun; Ramesh, Rahul; Nandi, Dip K; Bae, Jong-Seong; Kim, Soo-Hyun.

Afiliación

Kim DH; School of Materials Science and Engineering, Yeungnam University, 214-1, Dae-dong, Gyeongsan, Gyeongsangbuk-do 38541, Republic of Korea.
Ramesh R; School of Materials Science and Engineering, Yeungnam University, 214-1, Dae-dong, Gyeongsan, Gyeongsangbuk-do 38541, Republic of Korea.
Nandi DK; School of Materials Science and Engineering, Yeungnam University, 214-1, Dae-dong, Gyeongsan, Gyeongsangbuk-do 38541, Republic of Korea.
Bae JS; Busan Center, Korea Basic Science Institute, 1275 Jisadong, Gangseogu, Busan 618-230, Republic of Korea.
Kim SH; School of Materials Science and Engineering, Yeungnam University, 214-1, Dae-dong, Gyeongsan, Gyeongsangbuk-do 38541, Republic of Korea.

Nanotechnology ; 32(7): 075405, 2021 Feb 12.

Article en En | MEDLINE | ID: mdl-33108773

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nanotechnology Año: 2021 Tipo del documento: Article