The relationship between aluminium and silicon accumulation in leaves of Faramea marginata (Rubiaceae).

Britez, Ricardo M; Watanabe, Toshihiro; Jansen, Steven; Reissmann, Carlos B; Osaki, Mitsuru

Britez, Ricardo M; Watanabe, Toshihiro; Jansen, Steven; Reissmann, Carlos B; Osaki, Mitsuru.

Afiliación

Britez RM; Department of Soils, Federal University of Paraná, C. Postal 2959, 89.035-050, Curitiba/PR, Brazil.
Watanabe T; Graduate School of Agriculture, Hokkaido University, Kita 9, Nishi 9, Kitaku, Sapporo 060-8589, Japan.
Jansen S; Present address: Japan International Research Center for Agricultural Sciences, 1-1 Ohwashi, Tsukuba 305-8686, Japan.
Reissmann CB; Laboratory of Plant Systematics, Institute of Botany and Microbiology, K. U. Leuven, Kasteelpark Arenberg 31, B-3001 Leuven, Belgium.
Osaki M; Present address: Jodrell Laboratory, Royal Botanic Gardens, Kew, Richmond, Surrey TW9 3DS, UK.

New Phytol ; 156(3): 437-444, 2002 Dec.

Article en En | MEDLINE | ID: mdl-33873582

Palabras clave

Al accumulation; Al localization; Al-Si complex; Faramea marginata; Rubiaceae; aluminium; silicon

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: New Phytol Asunto de la revista: BOTANICA Año: 2002 Tipo del documento: Article País de afiliación: Brasil Pais de publicación: Reino Unido

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