Chemical vapor deposition merges MoS<sub>2</sub> grains into high-quality and centimeter-scale films on Si/SiO<sub>2</sub>.

Singh, Mukesh; Ghosh, Rapti; Chen, Yu-Siang; Yen, Zhi-Long; Hofmann, Mario; Chen, Yang-Fang; Hsieh, Ya-Ping

Chemical vapor deposition merges MoS₂ grains into high-quality and centimeter-scale films on Si/SiO₂.

Singh, Mukesh; Ghosh, Rapti; Chen, Yu-Siang; Yen, Zhi-Long; Hofmann, Mario; Chen, Yang-Fang; Hsieh, Ya-Ping.

Afiliación

Singh M; Department of Physics, National Taiwan University Taipei 106 Taiwan.
Ghosh R; Department of Physics, National Central University Chung Li 320 Taiwan.
Chen YS; Institute of Atomic and Molecular Sciences, Academia Sinica Taipei 115 Taiwan yphsieh@gate.sinica.edu.tw.
Yen ZL; Molecular Science and Technology, Taiwan International Graduate Program, Academia Sinica Taipei 115 Taiwan.
Hofmann M; Institute of Atomic and Molecular Sciences, Academia Sinica Taipei 115 Taiwan yphsieh@gate.sinica.edu.tw.
Chen YF; Department of Physics, National Taiwan University Taipei 106 Taiwan.
Hsieh YP; Department of Physics, National Taiwan University Taipei 106 Taiwan.

RSC Adv ; 12(10): 5990-5996, 2022 Feb 16.

Article en En | MEDLINE | ID: mdl-35424587

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: RSC Adv Año: 2022 Tipo del documento: Article Pais de publicación: Reino Unido

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