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Unravelling the electromechanical coupling in a graphene/bulk h-BN heterostructure.
Jiang, Xingan; Zhang, Xiangping; Han, Xiangyan; Lu, Jianming; Wang, Xueyun; Hong, Jiawang.
Afiliación
  • Jiang X; School of Aerospace Engineering, Beijing Institute of Technology, Beijing, 100081, China. xueyun@bit.edu.cn.
  • Zhang X; School of Aerospace Engineering, Beijing Institute of Technology, Beijing, 100081, China. xueyun@bit.edu.cn.
  • Han X; State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing 100871, China.
  • Lu J; State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-Optoelectronics, School of Physics, Peking University, Beijing 100871, China.
  • Wang X; School of Aerospace Engineering, Beijing Institute of Technology, Beijing, 100081, China. xueyun@bit.edu.cn.
  • Hong J; School of Aerospace Engineering, Beijing Institute of Technology, Beijing, 100081, China. xueyun@bit.edu.cn.
Nanoscale ; 14(42): 15869-15874, 2022 Nov 03.
Article en En | MEDLINE | ID: mdl-36260020
The stacking heterostructure of graphene on bulk h-BN produces a moiré pattern with topographic corrugation. The corrugation of the moiré pattern expectantly induces a considerable curvature and a flexoelectric response, which calls for a detailed study. In this work, we used lateral force microscopy, a scanning technique to locally observe the moiré pattern and topographic corrugation. The curvature and flexoelectric potentials are derived from the measured topographic corrugation, revealing a huge curvature of ∼107 m-1 and a flexoelectric potential of ∼10 mV in the hexagonal domain wall region (∼3-4 nm) of the moiré pattern. In addition, the domain walls of the moiré pattern also generate a clear electromechanical and frictional response, arising from the corrugation-induced flexoelectric response. In summary, the results of this work provide insights into the understanding of the flexoelectricity in the graphene/bulk h-BN and its associated electromechanical coupling behavior in the moiré pattern of a van der Waals stacking heterostructure.

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nanoscale Año: 2022 Tipo del documento: Article País de afiliación: China Pais de publicación: Reino Unido

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nanoscale Año: 2022 Tipo del documento: Article País de afiliación: China Pais de publicación: Reino Unido