Publisher Correction: Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control.

Nguyen, Chi Thang; Cho, Eun-Hyoung; Gu, Bonwook; Lee, Sunghee; Kim, Hae-Sung; Park, Jeongwoo; Yu, Neung-Kyung; Shin, Sangwoo; Shong, Bonggeun; Lee, Jeong Yub; Lee, Han-Bo-Ram

Nguyen, Chi Thang; Cho, Eun-Hyoung; Gu, Bonwook; Lee, Sunghee; Kim, Hae-Sung; Park, Jeongwoo; Yu, Neung-Kyung; Shin, Sangwoo; Shong, Bonggeun; Lee, Jeong Yub; Lee, Han-Bo-Ram.

Afiliación

Nguyen CT; Department of Materials Science and Engineering, Incheon National University, Incheon, 22012, Korea.
Cho EH; Beyond Silicon Lab, Samsung Advanced Institute of Technology, Gyeonggi, 16678, Korea.
Gu B; Department of Materials Science and Engineering, Incheon National University, Incheon, 22012, Korea.
Lee S; Beyond Silicon Lab, Samsung Advanced Institute of Technology, Gyeonggi, 16678, Korea.
Kim HS; Beyond Silicon Lab, Samsung Advanced Institute of Technology, Gyeonggi, 16678, Korea.
Park J; Department of Chemical Engineering, Hongik University, Seoul, 04066, Korea.
Yu NK; Department of Chemical Engineering, Hongik University, Seoul, 04066, Korea.
Shin S; Department of Mechanical and Aerospace Engineering, University at Buffalo, Buffalo, NY, 14260, USA.
Shong B; Department of Chemical Engineering, Hongik University, Seoul, 04066, Korea.
Lee JY; Beyond Silicon Lab, Samsung Advanced Institute of Technology, Gyeonggi, 16678, Korea.
Lee HB; Department of Materials Science and Engineering, Incheon National University, Incheon, 22012, Korea. hbrlee@inu.ac.kr.

Nat Commun ; 14(1): 184, 2023 Jan 12.

Article en En | MEDLINE | ID: mdl-36635326

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Nat Commun Asunto de la revista: BIOLOGIA / CIENCIA Año: 2023 Tipo del documento: Article Pais de publicación: Reino Unido

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