Optically modified second harmonic generation in silicon oxynitride thin films via local layer heating.

Lukes, Jakub; Kanclír, Vít; Václavík, Jan; Melich, Radek; Fuchs, Ulrike; Zídek, Karel

Lukes, Jakub; Kanclír, Vít; Václavík, Jan; Melich, Radek; Fuchs, Ulrike; Zídek, Karel.

Afiliación

Lukes J; TOPTEC Research Center, Institute of Plasma Physics of the Czech Academy of Sciences, Za Slovankou 1782/3, 182 00, Prague, Czech Republic.
Kanclír V; Technical University of Liberec, Faculty of Mechatronics, Informatics and Interdisciplinary Studies, Studentská 1402/2, 461 17, Liberec, Czech Republic.
Václavík J; TOPTEC Research Center, Institute of Plasma Physics of the Czech Academy of Sciences, Za Slovankou 1782/3, 182 00, Prague, Czech Republic.
Melich R; Technical University of Liberec, Faculty of Mechatronics, Informatics and Interdisciplinary Studies, Studentská 1402/2, 461 17, Liberec, Czech Republic.
Fuchs U; TOPTEC Research Center, Institute of Plasma Physics of the Czech Academy of Sciences, Za Slovankou 1782/3, 182 00, Prague, Czech Republic.
Zídek K; TOPTEC Research Center, Institute of Plasma Physics of the Czech Academy of Sciences, Za Slovankou 1782/3, 182 00, Prague, Czech Republic.

Sci Rep ; 13(1): 8658, 2023 May 29.

Article en En | MEDLINE | ID: mdl-37248249

Texto completo

Añadir a Mi BVS

Imprimir

XML

PubMed Links

Buscar en Google

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Sci Rep Año: 2023 Tipo del documento: Article País de afiliación: República Checa Pais de publicación: Reino Unido

Texto completo

Añadir a Mi BVS

Imprimir

XML

PubMed Links

Buscar en Google