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Nucleation and Layer Closure Behavior of Iridium Films Grown Using Atomic Layer Deposition.
Chung, Hong Keun; Kim, Han; Jeon, Jihoon; Kim, Sung-Chul; Won, Sung Ok; Harada, Ryosuke; Tsugawa, Tomohiro; Chung, Yoon Jang; Baek, Seung-Hyub; Park, Tae Joo; Kim, Seong Keun.
Afiliación
  • Chung HK; Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea.
  • Kim H; Department of Materials Science and Chemical Engineering, Hanyang University, Ansan 15588, South Korea.
  • Jeon J; Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea.
  • Kim SC; KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul 02841, South Korea.
  • Won SO; Electronic Materials Research Center, Korea Institute of Science and Technology, Seoul 02792, South Korea.
  • Harada R; KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul 02841, South Korea.
  • Tsugawa T; Advanced Analysis Center, Korea Institute of Science and Technology, Seoul 02792, South Korea.
  • Chung YJ; Advanced Analysis Center, Korea Institute of Science and Technology, Seoul 02792, South Korea.
  • Baek SH; Chemical Materials Development Division, TANAKA Precious Metals, Tsukuba 300-4247, Japan.
  • Park TJ; Chemical Materials Development Division, TANAKA Precious Metals, Tsukuba 300-4247, Japan.
  • Kim SK; Department of Chemical and Biological Engineering, Korea University, Seoul 02841, South Korea.
J Phys Chem Lett ; 14(28): 6486-6493, 2023 Jul 20.
Article en En | MEDLINE | ID: mdl-37439679
ABSTRACT
Understanding the initial growth process during atomic layer deposition (ALD) is essential for various applications employing ultrathin films. This study investigated the initial growth of ALD Ir films using tricarbonyl-(1,2,3-η)-1,2,3-tri(tert-butyl)-cyclopropenyl-iridium and O2. Isolated Ir nanoparticles were formed on the oxide surfaces during the initial growth stage, and their density and size were significantly influenced by the growth temperature and substrate surface, which strongly affected the precursor adsorption and surface diffusion of the adatoms. Higher-density and smaller nanoparticles were formed at high temperatures and on the Al2O3 surface, forming a continuous Ir film with a smaller thickness, resulting in a very smooth surface. These findings suggest that the initial growth behavior of the Ir films affects their surface roughness and continuity and that a comprehensive understanding of this behavior is necessary for the formation of continuous ultrathin metal films.

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: J Phys Chem Lett Año: 2023 Tipo del documento: Article País de afiliación: Corea del Sur

Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: J Phys Chem Lett Año: 2023 Tipo del documento: Article País de afiliación: Corea del Sur