Deposition of Uniform Nanoscale Patterns on Silicon Dioxide Based on Coaxial Jet Direct Writing.

Shi, Shiwei; Abbas, Zeshan; Zhao, Xiangyu; Liang, Junsheng; Wang, Dazhi

Shi, Shiwei; Abbas, Zeshan; Zhao, Xiangyu; Liang, Junsheng; Wang, Dazhi.

Afiliación

Shi S; Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian 116024, China.
Abbas Z; Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian 116024, China.
Zhao X; Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian 116024, China.
Liang J; Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian 116024, China.
Wang D; Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian 116024, China.

Polymers (Basel) ; 15(18)2023 Sep 08.

Article en En | MEDLINE | ID: mdl-37765556

Palabras clave

CE-jet morphology; drag; high-viscosity solution; multiphysics; phase field model; silicon dioxide

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: Polymers (Basel) Año: 2023 Tipo del documento: Article País de afiliación: China Pais de publicación: Suiza

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