Self-Diffusion versus Intentional Doping: Beneficial and Damaging Impact on Hematite Photoanode Interfaces.

Daminelli, Lara M; Rodríguez-Gutierrez, Ingrid; Pires, Fabio A; Dos Santos, Gabriel T; Bettini, Jefferson; Souza, Flavio L

Daminelli, Lara M; Rodríguez-Gutierrez, Ingrid; Pires, Fabio A; Dos Santos, Gabriel T; Bettini, Jefferson; Souza, Flavio L.

Afiliación

Daminelli LM; Brazilian Nanotechnology National Laboratory (LNNano), Brazilian Center for Research in Energy and Materials (CNPEM), Campinas, Sao PauloCEP 13083-100, Brazil.
Rodríguez-Gutierrez I; Humanities and Nature Science Center (CCNH), Federal University of ABC (UFABC), Santo André, Sao PauloCEP 09210-580, Brazil.
Pires FA; Brazilian Nanotechnology National Laboratory (LNNano), Brazilian Center for Research in Energy and Materials (CNPEM), Campinas, Sao PauloCEP 13083-100, Brazil.
Dos Santos GT; Brazilian Nanotechnology National Laboratory (LNNano), Brazilian Center for Research in Energy and Materials (CNPEM), Campinas, Sao PauloCEP 13083-100, Brazil.
Bettini J; Institute of Chemistry, University of Campinas (UNICAMP), PO Box 6154, Campinas, Sao PauloCEP 13083-970, Brazil.
Souza FL; Brazilian Nanotechnology National Laboratory (LNNano), Brazilian Center for Research in Energy and Materials (CNPEM), Campinas, Sao PauloCEP 13083-100, Brazil.

ACS Appl Mater Interfaces ; 15(47): 55030-55042, 2023 Nov 29.

Article en En | MEDLINE | ID: mdl-37943615

Palabras clave

FTO; buffer layer; glass diffusion; hematite; photoelectrochemical; unintentional doping

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Texto completo: 1 Colección: 01-internacional Base de datos: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Asunto de la revista: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Año: 2023 Tipo del documento: Article País de afiliación: Brasil Pais de publicación: Estados Unidos

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