Application of an alternating phase-shifting mask design method to near-field photolithography for fabricating more than 2 GHz SAW devices.
IEEE Trans Ultrason Ferroelectr Freq Control
; 54(10): 2208-13, 2007 Oct.
Article
de En
| MEDLINE
| ID: mdl-18019261
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Collection:
01-internacional
Base de données:
MEDLINE
Langue:
En
Journal:
IEEE Trans Ultrason Ferroelectr Freq Control
Sujet du journal:
MEDICINA NUCLEAR
Année:
2007
Type de document:
Article
Pays de publication:
États-Unis d'Amérique