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Annular fast electron transport in silicon arising from low-temperature resistivity.
MacLellan, D A; Carroll, D C; Gray, R J; Booth, N; Burza, M; Desjarlais, M P; Du, F; Gonzalez-Izquierdo, B; Neely, D; Powell, H W; Robinson, A P L; Rusby, D R; Scott, G G; Yuan, X H; Wahlström, C-G; McKenna, P.
Affiliation
  • MacLellan DA; Department of Physics, SUPA, University of Strathclyde, Glasgow G4 0NG, United Kingdom.
Phys Rev Lett ; 111(9): 095001, 2013 Aug 30.
Article de En | MEDLINE | ID: mdl-24033041
ABSTRACT
Fast electron transport in Si, driven by ultraintense laser pulses, is investigated experimentally and via 3D hybrid particle-in-cell simulations. A transition from a Gaussian-like to an annular fast electron beam profile is demonstrated and explained by resistively generated magnetic fields. The results highlight the potential to completely transform the beam transport pattern by tailoring the resistivity-temperature profile at temperatures as low as a few eV.
Recherche sur Google
Collection: 01-internacional Base de données: MEDLINE Langue: En Journal: Phys Rev Lett Année: 2013 Type de document: Article Pays d'affiliation: Royaume-Uni
Recherche sur Google
Collection: 01-internacional Base de données: MEDLINE Langue: En Journal: Phys Rev Lett Année: 2013 Type de document: Article Pays d'affiliation: Royaume-Uni