Facet-Mediated Growth of High-Quality Monolayer Graphene on Arbitrarily Rough Copper Surfaces.

Lee, Hyo Chan; Jo, Sae Byeok; Lee, Eunho; Yoo, Min Seok; Kim, Hyun Ho; Lee, Seong Kyu; Lee, Wi Hyoung; Cho, Kilwon

Lee, Hyo Chan; Jo, Sae Byeok; Lee, Eunho; Yoo, Min Seok; Kim, Hyun Ho; Lee, Seong Kyu; Lee, Wi Hyoung; Cho, Kilwon.

Affiliation

Lee HC; Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, 790-784, South Korea.
Jo SB; Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, 790-784, South Korea.
Lee E; Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, 790-784, South Korea.
Yoo MS; Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, 790-784, South Korea.
Kim HH; Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, 790-784, South Korea.
Lee SK; Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, 790-784, South Korea.
Lee WH; Department of Organic and Nano System Engineering, Konkuk University, Seoul, 143-701, South Korea.
Cho K; Department of Chemical Engineering, Pohang University of Science and Technology, Pohang, 790-784, South Korea.

Adv Mater ; 28(10): 2010-7, 2016 Mar 09.

Article de En | MEDLINE | ID: mdl-26766210

Mots clés

chemical vapor deposition; copper surfaces; faceting; graphene

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Texte intégral: 1 Collection: 01-internacional Base de données: MEDLINE Langue: En Journal: Adv Mater Sujet du journal: BIOFISICA / QUIMICA Année: 2016 Type de document: Article Pays d'affiliation: Corée du Sud Pays de publication: Allemagne

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