Thermal Management in Ni/Al Reactive Multilayers: Understanding and Preventing Reaction Quenching on Thin Film Heat Sinks.

Danzi, Stefano; Menétrey, Maxence; Wohlwend, Jelena; Spolenak, Ralph

Danzi, Stefano; Menétrey, Maxence; Wohlwend, Jelena; Spolenak, Ralph.

Affiliation

Danzi S; Laboratory for Nanometallurgy, Department of Materials , ETH Zurich , Zurich 8093 , Switzerland.
Menétrey M; Laboratory for Nanometallurgy, Department of Materials , ETH Zurich , Zurich 8093 , Switzerland.
Wohlwend J; Laboratory for Nanometallurgy, Department of Materials , ETH Zurich , Zurich 8093 , Switzerland.
Spolenak R; Laboratory for Nanometallurgy, Department of Materials , ETH Zurich , Zurich 8093 , Switzerland.

ACS Appl Mater Interfaces ; 11(45): 42479-42485, 2019 Nov 13.

Article de En | MEDLINE | ID: mdl-31682402

Mots clés

Ni/Al quenching; high-speed IR; reactive multilayers; thermal management; thin films

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Texte intégral: 1 Collection: 01-internacional Base de données: MEDLINE Langue: En Journal: ACS Appl Mater Interfaces Sujet du journal: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Année: 2019 Type de document: Article Pays d'affiliation: Suisse

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